Issued Patents All Time
Showing 26–50 of 62 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11651966 | Methods and apparatus for processing a substrate | Kartik Ramaswamy, Kenneth S. Collins, Steven Lane, Gonzalo Monroy, Yue Guo | 2023-05-16 |
| 11609349 | Determining properties of a subterranean formation using an acoustic wave equation with a reflectivity parameterization | Norman Daniel Whitmore, JR., Jaime Ramos-Martinez, Sean Crawley, Alejandro Antonio Valenciano Mavilio, Nizar Chemingui | 2023-03-21 |
| 11603591 | Pulsed plasma (DC/RF) deposition of high quality C films for patterning | Eswaranand Venkatasubramanian, Pramit Manna, Kartik Ramaswamy, Takehito Koshizawa, Abhijit Basu Mallick | 2023-03-14 |
| 11476090 | Voltage pulse time-domain multiplexing | Kartik Ramaswamy, Yue Guo | 2022-10-18 |
| 11469097 | Carbon hard masks for patterning applications and methods related thereto | Eswaranand Venkatasubramanian, Pramit Manna, Kartik Ramaswamy, Takehito Koshizawa, Abhijit Basu Mallick | 2022-10-11 |
| 11462386 | Electron beam apparatus for optical device fabrication | Kartik Ramaswamy, Manivannan Thothadri, Chien-An Chen, Ludovic Godet, Rutger Meyer Timmerman Thijssen | 2022-10-04 |
| 11448977 | Gas distribution plate with UV blocker at the center | Kartik Ramaswamy, Michael D. Willwerth | 2022-09-20 |
| 11447868 | Method for controlling a plasma process | Andrew Nguyen, Kartik Ramaswamy, Michael G. Chafin, Anilkumar Rayaroth, Lu Liu | 2022-09-20 |
| 11430634 | Methods of optical device fabrication using an electron beam apparatus | Ludovic Godet, Rutger Meyer Timmerman Thijssen, Kartik Ramaswamy, Manivannan Thothadri, Chien-An Chen | 2022-08-30 |
| 11101113 | Ion-ion plasma atomic layer etch process | Kenneth S. Collins, Kartik Ramaswamy, James D. Carducci, Shahid Rauf, Leonid Dorf | 2021-08-24 |
| 11043387 | Methods and apparatus for processing a substrate | Kartik Ramaswamy, Kenneth S. Collins, Steven Lane, Gonzalo Monroy, Yue Guo | 2021-06-22 |
| 11043372 | High-density low temperature carbon films for hardmask and other patterning applications | Eswaranand Venkatasubramanian, Samuel E. Gottheim, Pramit Manna, Kartik Ramaswamy, Takehito Koshizawa +2 more | 2021-06-22 |
| 11043375 | Plasma deposition of carbon hardmask | Eswaranand Venkatasubramanian, Kartik Ramaswamy, Kenneth S. Collins, Steven Lane, Gonzalo Monroy +2 more | 2021-06-22 |
| 10957518 | Chamber with individually controllable plasma generation regions for a reactor for processing a workpiece | Kartik Ramaswamy, Lawrence Wong, Steven Lane, Srinivas D. Nemani, Praburam Gopalraja | 2021-03-23 |
| 10818472 | Methods of optical device fabrication using an electron beam apparatus | Ludovic Godet, Rutger Meyer Timmerman Thijssen, Kartik Ramaswamy, Manivannan Thothadri, Chien-An Chen | 2020-10-27 |
| 10790153 | Methods and apparatus for electron beam etching process | Yue Guo, Kartik Ramaswamy, Kenneth S. Collins, Steven Lane, Gonzalo Monroy +1 more | 2020-09-29 |
| 10784085 | Plasma processing reactor with a magnetic electron-blocking filter external of the chamber and uniform field within the chamber | Kartik Ramaswamy, Kenneth S. Collins, Steven Lane, Lawrence Wong | 2020-09-22 |
| 10707086 | Etching methods | Kartik Ramaswamy, Kenneth S. Collins, Steven Lane, Gonzalo Monroy, Lucy Chen +1 more | 2020-07-07 |
| 10544505 | Deposition or treatment of diamond-like carbon in a plasma reactor | Kartik Ramaswamy, Kenneth S. Collins, Steven Lane, Gonzalo Monroy, Lucy Chen +1 more | 2020-01-28 |
| 10475626 | Ion-ion plasma atomic layer etch process and reactor | Kenneth S. Collins, Kartik Ramaswamy, James D. Carducci, Shahid Rauf, Leonid Dorf | 2019-11-12 |
| 10395904 | Method of real time in-situ chamber condition monitoring using sensors and RF communication | Lawrence Wong, Kartik Ramaswamy, Steven Lane, Richard Fovell | 2019-08-27 |
| 10249495 | Diamond like carbon layer formed by an electron beam plasma process | Lucy Chen, Jie Zhou, Kartik Ramaswamy, Kenneth S. Collins, Srinivas D. Nemani +5 more | 2019-04-02 |
| 10249479 | Magnet configurations for radial uniformity tuning of ICP plasmas | Joseph AuBuchon, Tza-Jing Gung, Travis Koh, Nattaworn Boss Nunta, Sheng-Chin Kung +2 more | 2019-04-02 |
| 10167560 | Method and apparatus for structural coloration of metallic surfaces | Ping Guo | 2019-01-01 |
| 10170278 | Inductively coupled plasma source | Andrew Nguyen, Kartik Ramaswamy, Steven Lane | 2019-01-01 |