Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12094707 | Plasma enhanced CVD with periodic high voltage bias | Kelvin Chan, Simon Huang, Philip Allan Kraus | 2024-09-17 |
| 11728124 | Creating ion energy distribution functions (IEDF) | Leonid Dorf, Olivier Luere, Olivier Joubert, Philip Allan Kraus, Rajinder Dhindsa +1 more | 2023-08-15 |
| 11069504 | Creating ion energy distribution functions (IEDF) | Leonid Dorf, Olivier Luere, Olivier Joubert, Philip Allan Kraus, Rajinder Dhindsa +1 more | 2021-07-20 |
| 10923320 | System for tunable workpiece biasing in a plasma reactor | Philip Allan Kraus, Leonid Dorf, Prabu Gopalraja | 2021-02-16 |
| 10904996 | Substrate support with electrically floating power supply | Haitao Wang, Philip Allan Kraus, Vijay D. Parkhe, Daniel Distaso, Christopher A. Rowland +2 more | 2021-01-26 |
| 10840086 | Plasma enhanced CVD with periodic high voltage bias | Kelvin Chan, Simon Huang, Philip Allan Kraus | 2020-11-17 |
| 10714372 | System for coupling a voltage to portions of a substrate | Thai Cheng Chua, Philip Allan Kraus, Christian Amormino, Jaeyong Cho | 2020-07-14 |
| 10685807 | Creating ion energy distribution functions (IEDF) | Leonid Dorf, Olivier Luere, Olivier Joubert, Philip Allan Kraus, Rajinder Dhindsa +1 more | 2020-06-16 |
| 10373804 | System for tunable workpiece biasing in a plasma reactor | Philip Allan Kraus, Leonid Dorf, Prabu Gopalraja | 2019-08-06 |
| 10312048 | Creating ion energy distribution functions (IEDF) | Leonid Dorf, Olivier Luere, Olivier Joubert, Philip Allan Kraus, Rajinder Dhindsa +1 more | 2019-06-04 |
| 10249479 | Magnet configurations for radial uniformity tuning of ICP plasmas | Joseph AuBuchon, Tza-Jing Gung, Nattaworn Boss Nunta, Sheng-Chin Kung, Steven Lane +2 more | 2019-04-02 |
| 10115566 | Method and apparatus for controlling a magnetic field in a plasma chamber | Steven Lane, Tza-Jing Gung, Kartik Ramaswamy, Joseph AuBuchon, Yang Yang | 2018-10-30 |
| 9659751 | System and method for selective coil excitation in inductively coupled plasma processing reactors | Kartik Ramaswamy, Yang Yang, Steven Lane, Lawrence Wong, Joseph AuBuchon | 2017-05-23 |
| 9613783 | Method and apparatus for controlling a magnetic field in a plasma chamber | Steven Lane, Tza-Jing Gung, Kartik Ramaswamy, Joseph AuBuchon, Yang Yang | 2017-04-04 |