| 12456611 |
Systems and methods for controlling a voltage waveform at a substrate during plasma processing |
Leonid Dorf, James Rogers, Olivier Luere, Rajinder Dhindsa, Sunil Srinivasan |
2025-10-28 |
|
| 12094707 |
Plasma enhanced CVD with periodic high voltage bias |
Kelvin Chan, Simon Huang, Philip Allan Kraus |
2024-09-17 |
$46,375,000 |
| 11728124 |
Creating ion energy distribution functions (IEDF) |
Leonid Dorf, Olivier Luere, Olivier Joubert, Philip Allan Kraus, Rajinder Dhindsa +1 more |
2023-08-15 |
$42,730,000 |
| 11069504 |
Creating ion energy distribution functions (IEDF) |
Leonid Dorf, Olivier Luere, Olivier Joubert, Philip Allan Kraus, Rajinder Dhindsa +1 more |
2021-07-20 |
$88,311,000 |
| 10923320 |
System for tunable workpiece biasing in a plasma reactor |
Philip Allan Kraus, Leonid Dorf, Prabu Gopalraja |
2021-02-16 |
$36,444,000 |
| 10904996 |
Substrate support with electrically floating power supply |
Haitao Wang, Philip Allan Kraus, Vijay D. Parkhe, Daniel Distaso, Christopher A. Rowland +2 more |
2021-01-26 |
$35,448,000 |
| 10840086 |
Plasma enhanced CVD with periodic high voltage bias |
Kelvin Chan, Simon Huang, Philip Allan Kraus |
2020-11-17 |
$41,112,000 |
| 10714372 |
System for coupling a voltage to portions of a substrate |
Thai Cheng Chua, Philip Allan Kraus, Christian Amormino, Jaeyong Cho |
2020-07-14 |
$28,056,000 |
| 10685807 |
Creating ion energy distribution functions (IEDF) |
Leonid Dorf, Olivier Luere, Olivier Joubert, Philip Allan Kraus, Rajinder Dhindsa +1 more |
2020-06-16 |
$36,933,000 |
| 10373804 |
System for tunable workpiece biasing in a plasma reactor |
Philip Allan Kraus, Leonid Dorf, Prabu Gopalraja |
2019-08-06 |
$24,698,000 |
| 10312048 |
Creating ion energy distribution functions (IEDF) |
Leonid Dorf, Olivier Luere, Olivier Joubert, Philip Allan Kraus, Rajinder Dhindsa +1 more |
2019-06-04 |
$18,308,000 |
| 10249479 |
Magnet configurations for radial uniformity tuning of ICP plasmas |
Joseph AuBuchon, Tza-Jing Gung, Nattaworn Boss Nunta, Sheng-Chin Kung, Steven Lane +2 more |
2019-04-02 |
$31,503,000 |
| 10115566 |
Method and apparatus for controlling a magnetic field in a plasma chamber |
Steven Lane, Tza-Jing Gung, Kartik Ramaswamy, Joseph AuBuchon, Yang Yang |
2018-10-30 |
$15,195,000 |
| 9659751 |
System and method for selective coil excitation in inductively coupled plasma processing reactors |
Kartik Ramaswamy, Yang Yang, Steven Lane, Lawrence Wong, Joseph AuBuchon |
2017-05-23 |
$22,760,000 |
| 9613783 |
Method and apparatus for controlling a magnetic field in a plasma chamber |
Steven Lane, Tza-Jing Gung, Kartik Ramaswamy, Joseph AuBuchon, Yang Yang |
2017-04-04 |
$16,159,000 |
