Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › System and method for selective coil excitation in inductively coupled plasma processing reactors

System and method for selective coil excitation in inductively coupled plasma processing reactors

US Patent 9659751 · Granted May 23, 2017

Estimated economic value: $22,760,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and apparatus for digital control of ion energy distribution in a plasma2025
Pulsed plasma (DC/RF) deposition of high quality C films for patterning2025
Gas distribution plate2025
Gas distribution plate2025
Method for forming integrated circuit structures2025
Methods and apparatus for processing a substrate2025
Radio-frequency (RF) matching network for fast impedance tuning2025
Wafer to baseplate arc prevention using textured dielectric2025
Methods of operating a spatial deposition tool2025
Inductively coupled plasma source with radial coil network2025
Auxiliary plasma source for robust ignition and restrikes in a plasma chamber2025
Systems and methods for controlling a voltage waveform at a substrate during pla2025