Issued Patents All Time
Showing 25 most recent of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11721566 | Sensor assembly and methods of vapor monitoring in process chambers | Xiaozhou Che, Graeme Scott, Richard Hagborg, Nelson Yee | 2023-08-08 |
| 11195756 | Proximity contact cover ring for plasma dicing | James M. Holden, Alexander Lerner, Ajay Kumar, Aparna Iyer | 2021-12-07 |
| 10595365 | Chamber lid heater ring assembly | Graeme Scott, Keven Yu, Michael N. Grimbergen | 2020-03-17 |
| 9478455 | Thermal pyrolytic graphite shadow ring assembly for heat dissipation in plasma chamber | Alexander Lerner | 2016-10-25 |
| 9378930 | Inductively coupled plasma reactor having RF phase control and methods of use thereof | Michael N. Grimbergen, Valentin N. Todorow | 2016-06-28 |
| 9293304 | Plasma thermal shield for heat dissipation in plasma chamber | — | 2016-03-22 |
| 9236284 | Cooled tape frame lift and low contact shadow ring for plasma heat isolation | — | 2016-01-12 |
| 9165812 | Cooled tape frame lift and low contact shadow ring for plasma heat isolation | — | 2015-10-20 |
| 8668776 | Gas delivery apparatus and method for atomic layer deposition | Ling Chen, Vincent Ku, Dien-Yeh Wu, Hua Chung, Norman Nakashima | 2014-03-11 |
| 8568553 | Method and apparatus for photomask plasma etching | Ajay Kumar, Madhavi R. Chandrachood, Richard Lewington, Darin Bivens, Amitabh Sabharwal +1 more | 2013-10-29 |
| 8062422 | Method and apparatus for generating a precursor for a semiconductor processing system | Ling Chen, Vincent Ku, Hua Chung, Christophe Marcadal, Seshadri Ganguli +3 more | 2011-11-22 |
| 7943005 | Method and apparatus for photomask plasma etching | Ajay Kumar, Madhavi R. Chandrachood, Richard Lewington, Darin Bivens, Amitabh Sabharwal +1 more | 2011-05-17 |
| 7909961 | Method and apparatus for photomask plasma etching | Ajay Kumar, Madhavi R. Chandrachood, Richard Lewington, Darin Bivens, Amitabh Sabharwal +1 more | 2011-03-22 |
| 7780785 | Gas delivery apparatus for atomic layer deposition | Ling Chen, Vincent Ku, Dien-Yeh Wu, Hua Chung, Norman Nakashima +1 more | 2010-08-24 |
| 7780788 | Gas delivery apparatus for atomic layer deposition | Ling Chen, Vincent Ku, Dien-Yeh Wu, Hua Chung, Norman Nakashima | 2010-08-24 |
| 7775508 | Ampoule for liquid draw and vapor draw with a continuous level sensor | Kenric Choi, Pravin K. Narwankar, Shreyas Kher, Son T. Nguyen, Paul Deaton +3 more | 2010-08-17 |
| 7699023 | Gas delivery apparatus for atomic layer deposition | Ling Chen, Vincent Ku, Dien-Yeh Wu, Hua Chung, Norman Nakashima +1 more | 2010-04-20 |
| 7597758 | Chemical precursor ampoule for vapor deposition processes | Ling Chen, Vincent Ku, Hua Chung, Christophe Marcadal, Seshadri Ganguli +3 more | 2009-10-06 |
| 7588736 | Apparatus and method for generating a chemical precursor | Ling Chen, Vincent Ku, Hua Chung, Christophe Marcadal, Seshadri Ganguli +3 more | 2009-09-15 |
| 7524374 | Method and apparatus for generating a precursor for a semiconductor processing system | Ling Chen, Vincent Ku, Hua Chung, Christophe Marcadal, Seshadri Ganguli +3 more | 2009-04-28 |
| 7270709 | Method and apparatus of generating PDMAT precursor | Ling Chen, Vincent Ku, Hua Chung, Christophe Marcadal, Seshadri Ganguli +3 more | 2007-09-18 |
| 6955211 | Method and apparatus for gas temperature control in a semiconductor processing system | Vincent Ku, Ling Chen, Dien-Yeh Wu, Irena H. Wysok | 2005-10-18 |
| 6916398 | Gas delivery apparatus and method for atomic layer deposition | Ling Chen, Vincent Ku, Dien-Yeh Wu, Hua Chung, Norman Nakashima | 2005-07-12 |
| 6905541 | Method and apparatus of generating PDMAT precursor | Ling Chen, Vincent Ku, Hua Chung, Christophe Marcadal, Seshadri Ganguli +3 more | 2005-06-14 |
| 6598316 | Apparatus to reduce contaminants from semiconductor wafers | — | 2003-07-29 |