| 10170280 |
Plasma reactor having an array of plural individually controlled gas injectors arranged along a circular side wall |
Madhavi R. Chandrachood, Michael N. Grimbergen, Khiem K. Nguyen, Ibrahim M. Ibrahim, Sheeba J. Panayil +1 more |
2019-01-01 |
| 9218944 |
Mask etch plasma reactor having an array of optical sensors viewing the workpiece backside and a tunable element controlled in response to the optical sensors |
Madhavi R. Chandrachood, Michael N. Grimbergen, Khiem K. Nguyen, Ibrahim M. Ibrahim, Sheeba J. Panayil +1 more |
2015-12-22 |
| 8568553 |
Method and apparatus for photomask plasma etching |
Ajay Kumar, Madhavi R. Chandrachood, Darin Bivens, Amitabh Sabharwal, Sheeba J. Panayil +1 more |
2013-10-29 |
| 8017029 |
Plasma mask etch method of controlling a reactor tunable element in accordance with the output of an array of optical sensors viewing the mask backside |
Madhavi R. Chandrachood, Michael N. Grimbergen, Khiem K. Nguyen, Ibrahim M. Ibrahim, Sheeba J. Panayil +1 more |
2011-09-13 |
| 8012366 |
Process for etching a transparent workpiece including backside endpoint detection steps |
Michael N. Grimbergen, Khiem K. Nguyen, Darin Bivens, Madhavi R. Chandrachood, Ajay Kumar |
2011-09-06 |
| 8002946 |
Mask etch plasma reactor with cathode providing a uniform distribution of etch rate |
Michael N. Grimbergen, Khiem K. Nguyen, Darin Bivens, Madhavi R. Chandrachood, Ajay Kumar |
2011-08-23 |
| 7976671 |
Mask etch plasma reactor with variable process gas distribution |
Madhavi R. Chandrachood, Michael N. Grimbergen, Khiem K. Nguyen, Ibrahim M. Ibrahim, Sheeba J. Panayil +1 more |
2011-07-12 |
| 7967930 |
Plasma reactor for processing a workpiece and having a tunable cathode |
Michael N. Grimbergen, Khiem K. Nguyen, Darin Bivens, Madhavi R. Chandrachood, Ajay Kumar |
2011-06-28 |
| 7964818 |
Method and apparatus for photomask etching |
Elmira Ryabova, Madhavi R. Chandrachood, Amitabh Sabharwal, Darin Bivens |
2011-06-21 |
| 7943005 |
Method and apparatus for photomask plasma etching |
Ajay Kumar, Madhavi R. Chandrachood, Darin Bivens, Amitabh Sabharwal, Sheeba J. Panayil +1 more |
2011-05-17 |
| 7909961 |
Method and apparatus for photomask plasma etching |
Ajay Kumar, Madhavi R. Chandrachood, Darin Bivens, Amitabh Sabharwal, Sheeba J. Panayil +1 more |
2011-03-22 |
| 7846848 |
Cluster tool with integrated metrology chamber for transparent substrates |
Corey J. Collard, Scott Anderson, Khiem K. Nguyen |
2010-12-07 |
| 7601272 |
Method and apparatus for integrating metrology with etch processing |
Khiem K. Nguyen |
2009-10-13 |
| 7520999 |
Method of processing a workpiece in a plasma reactor with dynamic adjustment of the plasma source power applicator and the workpiece relative to one another |
Madhavi R. Chandrachood, Darin Bivens, Ajay Kumar, Ibrahim M. Ibrahim, Michael N. Grimbergen +2 more |
2009-04-21 |
| 7504041 |
Method of processing a workpiece in a plasma reactor employing a dynamically adjustable plasma source power applicator |
Madhavi R. Chandrachood, Darin Bivens, Ajay Kumar, Ibrahim M. Ibrahim, Michael N. Grimbergen +2 more |
2009-03-17 |
| 7431797 |
Plasma reactor with a dynamically adjustable plasma source power applicator |
Madhavi R. Chandrachood, Darin Bivens, Ajay Kumar, Ibrahim M. Ibrahim, Michael N. Grimbergen +2 more |
2008-10-07 |
| 7419551 |
Plasma reactor with apparatus for dynamically adjusting the plasma source power applicator and the workpiece relative to one another |
Madhavi R. Chandrachood, Darin Bivens, Ajay Kumar, Ibrahim M. Ibrahim, Michael N. Grimbergen +2 more |
2008-09-02 |
