Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12007686 | Etch processing system having reflective endpoint detection | Michael N. Grimbergen | 2024-06-11 |
| 11710621 | Direct lift cathode for lithography mask chamber | — | 2023-07-25 |
| 11022877 | Etch processing system having reflective endpoint detection | Michael N. Grimbergen | 2021-06-01 |
| 10535549 | Lift pin holder | — | 2020-01-14 |
| 10170280 | Plasma reactor having an array of plural individually controlled gas injectors arranged along a circular side wall | Madhavi R. Chandrachood, Michael N. Grimbergen, Richard Lewington, Ibrahim M. Ibrahim, Sheeba J. Panayil +1 more | 2019-01-01 |
| 9978632 | Direct lift process apparatus | Saravjeet Singh, Amitabh Sabharwal | 2018-05-22 |
| 9218944 | Mask etch plasma reactor having an array of optical sensors viewing the workpiece backside and a tunable element controlled in response to the optical sensors | Madhavi R. Chandrachood, Michael N. Grimbergen, Richard Lewington, Ibrahim M. Ibrahim, Sheeba J. Panayil +1 more | 2015-12-22 |
| 8017029 | Plasma mask etch method of controlling a reactor tunable element in accordance with the output of an array of optical sensors viewing the mask backside | Madhavi R. Chandrachood, Michael N. Grimbergen, Richard Lewington, Ibrahim M. Ibrahim, Sheeba J. Panayil +1 more | 2011-09-13 |
| 8012366 | Process for etching a transparent workpiece including backside endpoint detection steps | Richard Lewington, Michael N. Grimbergen, Darin Bivens, Madhavi R. Chandrachood, Ajay Kumar | 2011-09-06 |
| 8002946 | Mask etch plasma reactor with cathode providing a uniform distribution of etch rate | Richard Lewington, Michael N. Grimbergen, Darin Bivens, Madhavi R. Chandrachood, Ajay Kumar | 2011-08-23 |
| 7976671 | Mask etch plasma reactor with variable process gas distribution | Madhavi R. Chandrachood, Michael N. Grimbergen, Richard Lewington, Ibrahim M. Ibrahim, Sheeba J. Panayil +1 more | 2011-07-12 |
| 7967930 | Plasma reactor for processing a workpiece and having a tunable cathode | Richard Lewington, Michael N. Grimbergen, Darin Bivens, Madhavi R. Chandrachood, Ajay Kumar | 2011-06-28 |
| 7879151 | Mask etch processing apparatus | Peter Satitpunwaycha, Alfred Mak | 2011-02-01 |
| 7846848 | Cluster tool with integrated metrology chamber for transparent substrates | Richard Lewington, Corey J. Collard, Scott Anderson | 2010-12-07 |
| 7682984 | Interferometer endpoint monitoring device | Peter Satitpunwaycha, Alfred Mak | 2010-03-23 |
| 7601272 | Method and apparatus for integrating metrology with etch processing | Richard Lewington | 2009-10-13 |
| 7128806 | Mask etch processing apparatus | Peter Satitpunwaycha, Alfred Mak | 2006-10-31 |