Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8568553 | Method and apparatus for photomask plasma etching | Ajay Kumar, Madhavi R. Chandrachood, Richard Lewington, Amitabh Sabharwal, Sheeba J. Panayil +1 more | 2013-10-29 |
| 8012366 | Process for etching a transparent workpiece including backside endpoint detection steps | Richard Lewington, Michael N. Grimbergen, Khiem K. Nguyen, Madhavi R. Chandrachood, Ajay Kumar | 2011-09-06 |
| 8002946 | Mask etch plasma reactor with cathode providing a uniform distribution of etch rate | Richard Lewington, Michael N. Grimbergen, Khiem K. Nguyen, Madhavi R. Chandrachood, Ajay Kumar | 2011-08-23 |
| 7967930 | Plasma reactor for processing a workpiece and having a tunable cathode | Richard Lewington, Michael N. Grimbergen, Khiem K. Nguyen, Madhavi R. Chandrachood, Ajay Kumar | 2011-06-28 |
| 7964818 | Method and apparatus for photomask etching | Elmira Ryabova, Richard Lewington, Madhavi R. Chandrachood, Amitabh Sabharwal | 2011-06-21 |
| 7943005 | Method and apparatus for photomask plasma etching | Ajay Kumar, Madhavi R. Chandrachood, Richard Lewington, Amitabh Sabharwal, Sheeba J. Panayil +1 more | 2011-05-17 |
| 7909961 | Method and apparatus for photomask plasma etching | Ajay Kumar, Madhavi R. Chandrachood, Richard Lewington, Amitabh Sabharwal, Sheeba J. Panayil +1 more | 2011-03-22 |
| 7520999 | Method of processing a workpiece in a plasma reactor with dynamic adjustment of the plasma source power applicator and the workpiece relative to one another | Madhavi R. Chandrachood, Richard Lewington, Ajay Kumar, Ibrahim M. Ibrahim, Michael N. Grimbergen +2 more | 2009-04-21 |
| 7504041 | Method of processing a workpiece in a plasma reactor employing a dynamically adjustable plasma source power applicator | Madhavi R. Chandrachood, Richard Lewington, Ajay Kumar, Ibrahim M. Ibrahim, Michael N. Grimbergen +2 more | 2009-03-17 |
| 7431797 | Plasma reactor with a dynamically adjustable plasma source power applicator | Madhavi R. Chandrachood, Richard Lewington, Ajay Kumar, Ibrahim M. Ibrahim, Michael N. Grimbergen +2 more | 2008-10-07 |
| 7419551 | Plasma reactor with apparatus for dynamically adjusting the plasma source power applicator and the workpiece relative to one another | Madhavi R. Chandrachood, Richard Lewington, Ajay Kumar, Ibrahim M. Ibrahim, Michael N. Grimbergen +2 more | 2008-09-02 |