Issued Patents All Time
Showing 1–25 of 36 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11915932 | Plasma etching of mask materials | Toi Yue Becky Leung, Madhava Rao Yalamanchili | 2024-02-27 |
| 11249386 | Extreme ultraviolet mask with backside coating | Vibhu Jindal, Vikash Banthia | 2022-02-15 |
| 10170280 | Plasma reactor having an array of plural individually controlled gas injectors arranged along a circular side wall | Michael N. Grimbergen, Khiem K. Nguyen, Richard Lewington, Ibrahim M. Ibrahim, Sheeba J. Panayil +1 more | 2019-01-01 |
| 9218944 | Mask etch plasma reactor having an array of optical sensors viewing the workpiece backside and a tunable element controlled in response to the optical sensors | Michael N. Grimbergen, Khiem K. Nguyen, Richard Lewington, Ibrahim M. Ibrahim, Sheeba J. Panayil +1 more | 2015-12-22 |
| 8778574 | Method for etching EUV material layers utilized to form a photomask | Keven Yu, Amitabh Sabharwal, Ajay Kumar | 2014-07-15 |
| 8568553 | Method and apparatus for photomask plasma etching | Ajay Kumar, Richard Lewington, Darin Bivens, Amitabh Sabharwal, Sheeba J. Panayil +1 more | 2013-10-29 |
| 8293430 | Method for etching a molybdenum layer suitable for photomask fabrication | Ajay Kumar, Wai-Fan Yau | 2012-10-23 |
| 8202441 | Process for etching a metal layer suitable for use in photomask fabrication | Nicole Sandlin, Yung-Hee Yvette Lee, Jian Ding | 2012-06-19 |
| 8017029 | Plasma mask etch method of controlling a reactor tunable element in accordance with the output of an array of optical sensors viewing the mask backside | Michael N. Grimbergen, Khiem K. Nguyen, Richard Lewington, Ibrahim M. Ibrahim, Sheeba J. Panayil +1 more | 2011-09-13 |
| 8012366 | Process for etching a transparent workpiece including backside endpoint detection steps | Richard Lewington, Michael N. Grimbergen, Khiem K. Nguyen, Darin Bivens, Ajay Kumar | 2011-09-06 |
| 8002946 | Mask etch plasma reactor with cathode providing a uniform distribution of etch rate | Richard Lewington, Michael N. Grimbergen, Khiem K. Nguyen, Darin Bivens, Ajay Kumar | 2011-08-23 |
| 7976671 | Mask etch plasma reactor with variable process gas distribution | Michael N. Grimbergen, Khiem K. Nguyen, Richard Lewington, Ibrahim M. Ibrahim, Sheeba J. Panayil +1 more | 2011-07-12 |
| 7967930 | Plasma reactor for processing a workpiece and having a tunable cathode | Richard Lewington, Michael N. Grimbergen, Khiem K. Nguyen, Darin Bivens, Ajay Kumar | 2011-06-28 |
| 7964818 | Method and apparatus for photomask etching | Elmira Ryabova, Richard Lewington, Amitabh Sabharwal, Darin Bivens | 2011-06-21 |
| 7955516 | Etching of nano-imprint templates using an etch reactor | Ajay Kumar | 2011-06-07 |
| 7943005 | Method and apparatus for photomask plasma etching | Ajay Kumar, Richard Lewington, Darin Bivens, Amitabh Sabharwal, Sheeba J. Panayil +1 more | 2011-05-17 |
| 7909961 | Method and apparatus for photomask plasma etching | Ajay Kumar, Richard Lewington, Darin Bivens, Amitabh Sabharwal, Sheeba J. Panayil +1 more | 2011-03-22 |
| 7829243 | Method for plasma etching a chromium layer suitable for photomask fabrication | Xiaoyi Chen, Michael N. Grimbergen, Jeffrey X. Tran, Ajay Kumar, Simon W. Tam +1 more | 2010-11-09 |
| 7790334 | Method for photomask plasma etching using a protected mask | Ajay Kumar, Wai-Fan Yau | 2010-09-07 |
| 7771895 | Method of etching extreme ultraviolet light (EUV) photomasks | Banqiu Wu, Ajay Kumar | 2010-08-10 |
| 7682518 | Process for etching a metal layer suitable for use in photomask fabrication | Nicole Sandlin, Yung-Hee Yvette Lee, Jian Ding | 2010-03-23 |
| 7520999 | Method of processing a workpiece in a plasma reactor with dynamic adjustment of the plasma source power applicator and the workpiece relative to one another | Richard Lewington, Darin Bivens, Ajay Kumar, Ibrahim M. Ibrahim, Michael N. Grimbergen +2 more | 2009-04-21 |
| 7521000 | Process for etching photomasks | Nicole Sandlin, Yung-Hee Yvette Lee, Jian Ding | 2009-04-21 |
| 7504041 | Method of processing a workpiece in a plasma reactor employing a dynamically adjustable plasma source power applicator | Richard Lewington, Darin Bivens, Ajay Kumar, Ibrahim M. Ibrahim, Michael N. Grimbergen +2 more | 2009-03-17 |
| 7431797 | Plasma reactor with a dynamically adjustable plasma source power applicator | Richard Lewington, Darin Bivens, Ajay Kumar, Ibrahim M. Ibrahim, Michael N. Grimbergen +2 more | 2008-10-07 |