Issued Patents All Time
Showing 25 most recent of 55 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12148597 | Multi-zone gas distribution systems and methods | Kenneth D. Schatz, Alan Tso, Marlin Wijekoon, Dimitri Kioussis | 2024-11-19 |
| 12131952 | Wafer dicing using femtosecond-based laser and plasma etch | Wei-Sheng Lei, Brad Eaton, Madhava Rao Yalamanchili, Ajay Kumar, James M. Holden | 2024-10-29 |
| 11915911 | Two piece electrode assembly with gap for plasma control | Tien Fak Tan, Dmitry Lubomirsky, Tae Wan Kim, Kenneth D. Schatz, Tae Seung Cho +1 more | 2024-02-27 |
| 11834744 | Ceramic showerheads with conductive electrodes | Laksheswar Kalita, Soonam Park, Dmitry Lubomirsky, Tien Fak Tan, LokKee Loh +1 more | 2023-12-05 |
| 11637002 | Methods and systems to enhance process uniformity | Alan Tso, Jingchun Zhang, Zihui Li, Hanshen Zhang, Dmitry Lubomirsky | 2023-04-25 |
| 11621194 | Wafer dicing using femtosecond-based laser and plasma etch | Wei-Sheng Lei, Brad Eaton, Madhava Rao Yalamanchili, Ajay Kumar, James M. Holden | 2023-04-04 |
| 11591693 | Ceramic showerheads with conductive electrodes | Laksheswar Kalita, Soonam Park, Dmitry Lubomirsky, Tien Fak Tan, LokKee Loh +1 more | 2023-02-28 |
| 11581165 | Multi-zone gas distribution systems and methods | Kenneth D. Schatz, Alan Tso, Marlin Wijekoon, Dimitri Kioussis | 2023-02-14 |
| 11239061 | Methods and systems to enhance process uniformity | Alan Tso, Jingchun Zhang, Zihui Li, Hanshen Zhang, Dmitry Lubomirsky | 2022-02-01 |
| 10920319 | Ceramic showerheads with conductive electrodes | Laksheswar Kalita, Soonam Park, Dmitry Lubomirsky, Tien Fak Tan, LokKee Loh +1 more | 2021-02-16 |
| 10910271 | Wafer dicing using femtosecond-based laser and plasma etch | Wei-Sheng Lei, Brad Eaton, Madhava Rao Yalamanchili, Ajay Kumar, James M. Holden | 2021-02-02 |
| 10903054 | Multi-zone gas distribution systems and methods | Kenneth D. Schatz, Alan Tso, Marlin Wijekoon, Dimitri Kioussis | 2021-01-26 |
| 10892198 | Systems and methods for improved performance in semiconductor processing | Chirantha Rodrigo, Suketu Arun Parikh, Tsz Keung Cheung, Satya Gowthami Achanta, Jingchun Zhang +1 more | 2021-01-12 |
| 10811232 | Multi-plate faceplate for a processing chamber | Deepak Doddabelavangala Srikantaiah, Sheshraj Tulshibagwale, Alexander Tam | 2020-10-20 |
| 10714390 | Wafer dicing using femtosecond-based laser and plasma etch | Wei-Sheng Lei, Brad Eaton, Madhava Rao Yalamanchili, Ajay Kumar, James M. Holden | 2020-07-14 |
| 10699879 | Two piece electrode assembly with gap for plasma control | Tien Fak Tan, Dmitry Lubomirsky, Tae Wan Kim, Kenneth D. Schatz, Tae Seung Cho +1 more | 2020-06-30 |
| 10566238 | Wafer dicing using femtosecond-based laser and plasma etch | Wei-Sheng Lei, Brad Eaton, Madhava Rao Yalamanchili, Ajay Kumar, James M. Holden | 2020-02-18 |
| 10170277 | Apparatus and methods for dry etch with edge, side and back protection | Graeme Scott, Amitabh Sabharwal, Ajay Kumar | 2019-01-01 |
| 10163713 | Wafer dicing using femtosecond-based laser and plasma etch | Wei-Sheng Lei, Brad Eaton, Madhava Rao Yalamanchili, Ajay Kumar, James M. Holden | 2018-12-25 |
| 9978632 | Direct lift process apparatus | Khiem K. Nguyen, Amitabh Sabharwal | 2018-05-22 |
| 9754765 | Electrodes for etch | Banqiu Wu, Amitabh Sabharwal, Ajay Kumar | 2017-09-05 |
| 9488315 | Gas distribution apparatus for directional and proportional delivery of process gas to a process chamber | Roy C. Nangoy | 2016-11-08 |
| 9305810 | Method and apparatus for fast gas exchange, fast gas switching, and programmable gas delivery | Roy C. Nangoy | 2016-04-05 |
| 9287093 | Dynamic ion radical sieve and ion radical aperture for an inductively coupled plasma (ICP) reactor | Graeme Scott, Ajay Kumar | 2016-03-15 |
| 9263308 | Water soluble mask for substrate dicing by laser and plasma etch | Wei-Sheng Lei, Madhava Rao Yalamanchili, Brad Eaton, Ajay Kumar | 2016-02-16 |