Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12406832 | Semiconductor chamber components with advanced dual layer nickel-containing coatings | Nitin K. Ingle, Nilesh Mistry, Jonathan Strahle, Christopher Laurent Beaudry, Lok Kee Loh | 2025-09-02 |
| 12362150 | Semiconductor chamber components with advanced coating techniques | Joseph Behnke, Ryan Pakulski, Christopher Laurent Beaudry, Jonathan Strahle | 2025-07-15 |
| 11834744 | Ceramic showerheads with conductive electrodes | Soonam Park, Dmitry Lubomirsky, Tien Fak Tan, LokKee Loh, Saravjeet Singh +1 more | 2023-12-05 |
| 11715625 | Semiconductor processing chamber | Greg Toland, Kenneth D. Schatz, Dmitry Lubomirsky | 2023-08-01 |
| 11591693 | Ceramic showerheads with conductive electrodes | Soonam Park, Dmitry Lubomirsky, Tien Fak Tan, LokKee Loh, Saravjeet Singh +1 more | 2023-02-28 |
| 11562890 | Corrosion resistant ground shield of processing chamber | Dmitry Lubomirsky, Xiao-Ming He, Jennifer Y. Sun, Xiaowei Wu, Soonam Park | 2023-01-24 |
| 11557464 | Semiconductor chamber coatings and processes | Son T. Nguyen, Dmitry Lubomirsky, Kenneth D. Schatz | 2023-01-17 |
| 11515195 | Semiconductor chamber components with high-performance coating | — | 2022-11-29 |
| 10920319 | Ceramic showerheads with conductive electrodes | Soonam Park, Dmitry Lubomirsky, Tien Fak Tan, LokKee Loh, Saravjeet Singh +1 more | 2021-02-16 |
| 10755900 | Multi-layer plasma erosion protection for chamber components | Toan Q. Tran, Tae Won Kim, Dmitry Lubomirsky, Xiaowei Wu, Xiao-Ming He +2 more | 2020-08-25 |
| 10407789 | Uniform crack-free aluminum deposition by two step aluminum electroplating process | Balaji Ganapathy, Ankur Kadam, Prerna Goradia, Tapash Chakraborty, Vijay Bhan Sharma | 2019-09-10 |
| 10253406 | Method for forming yttrium oxide on semiconductor processing equipment | Prerna Goradia, Geetika Bajaj, Yogita Pareek, Yixing Lin, Dmitry Lubomirsky +4 more | 2019-04-09 |
| 10233554 | Aluminum electroplating and oxide formation as barrier layer for aluminum semiconductor process equipment | Yogita Pareek, Geetika Bajaj, Kevin A. PAPKE, Ankur Kadam, Bipin Thakur +3 more | 2019-03-19 |
| 9903020 | Generation of compact alumina passivation layers on aluminum plasma equipment components | Sung Je Kim, Yogita Pareek, Ankur Kadam, Prerna Goradia, Bipin Thakur +1 more | 2018-02-27 |