Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11898245 | High throughput and metal contamination control oven for chamber component cleaning process | Chien-Min Liao, Chi-Feng Liu, Yi Nung Wu, Hsiu Yang, Boon Sen Chan +1 more | 2024-02-13 |
| 11866821 | Substrate support cover for high-temperature corrosive environment | Shuran Sheng, Lin Zhang, Jiyong Huang, Joseph C. Werner, Stanley Wu +3 more | 2024-01-09 |
| 11047035 | Protective yttria coating for semiconductor equipment parts | Ramesh Gopalan, Tasnuva Tabassum, Siamak Salimian, Yikai Chen, Kevin A. PAPKE | 2021-06-29 |
| 10583465 | 30 nm in-line LPC testing and cleaning of semiconductor processing equipment | Jianqi Wang, William M. Lu, Kevin A. PAPKE | 2020-03-10 |
| 10253406 | Method for forming yttrium oxide on semiconductor processing equipment | Laksheswar Kalita, Prerna Goradia, Geetika Bajaj, Yogita Pareek, Dmitry Lubomirsky +4 more | 2019-04-09 |
| 10233554 | Aluminum electroplating and oxide formation as barrier layer for aluminum semiconductor process equipment | Yogita Pareek, Laksheswar Kalita, Geetika Bajaj, Kevin A. PAPKE, Ankur Kadam +3 more | 2019-03-19 |
| 8021743 | Process chamber component with layered coating and method | Daijiang Xu, Clifford Stow | 2011-09-20 |
| 7910218 | Cleaning and refurbishing chamber components having metal coatings | Dajiang Xu, Clifford Stow | 2011-03-22 |
| 7579067 | Process chamber component with layered coating and method | Dajiang Xu, Clifford Stow | 2009-08-25 |
| 7055732 | Semiconductor processing apparatus including plasma-resistant, welded aluminum structures | Senh Thach, Jennifer Y. Sun, Shun Wu, Clifford Stow | 2006-06-06 |
| 7048814 | Halogen-resistant, anodized aluminum for use in semiconductor processing apparatus | Brian T. West, Hong Wang, Shun Wu, Jennifer Y. Sun, Clifford Stow +1 more | 2006-05-23 |
| 7033447 | Halogen-resistant, anodized aluminum for use in semiconductor processing apparatus | Brian T. West, Shun Wu, Clifford Stow, Senh Thach, Hong Wang +1 more | 2006-04-25 |
| 6776873 | Yttrium oxide based surface coating for semiconductor IC processing vacuum chambers | Jennifer Y. Sun, Shun Wu, Senh Thach, Ananda H. Kumar, Robert Wu +2 more | 2004-08-17 |
| 6713188 | Clean aluminum alloy for semiconductor processing equipment | Shun Wu, Clifford Stow, Hong Wang, Brian T. West | 2004-03-30 |
| 6659331 | Plasma-resistant, welded aluminum structures for use in semiconductor apparatus | Senh Thach, Jennifer Y. Sun, Shun Wu, Clifford Stow | 2003-12-09 |
| 6565984 | Clean aluminum alloy for semiconductor processing equipment | Shun Wu, Clifford Stow, Hong Wang | 2003-05-20 |