Issued Patents All Time
Showing 25 most recent of 37 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| D1027120 | Seal for an assembly in a vapor deposition chamber | Yao-Hung YANG, Eric Ruhland, Saurabh M. Chaudhari, Dien-Yeh Wu, Philip Wayne Nagle +4 more | 2024-05-14 |
| 11898245 | High throughput and metal contamination control oven for chamber component cleaning process | Chien-Min Liao, Chi-Feng Liu, Yi Nung Wu, Hsiu Yang, Yixing Lin +1 more | 2024-02-13 |
| 11856706 | Method and system for improving the operation of semiconductor processing | Hsui Yang, Yao-Hung YANG, Jeevan Shanbhag, Chien-Min Liao, Earl Hunter +4 more | 2023-12-26 |
| 11532466 | Part-life estimation utilizing feature metrology | Chien-Min Liao, Yao-Hung YANG, Tom K. Cho, Hsiu Yang, Chun-Chung Chen | 2022-12-20 |
| 11521839 | Inline measurement of process gas dissociation using infrared absorption | Ramesh Gopalan | 2022-12-06 |
| 11398369 | Method and apparatus for actively tuning a plasma power source | Rongping Wang, Tom K. Cho | 2022-07-26 |
| 11090893 | Method of reclaiming a seal | Shagun P. Maheshwari, Yao-Hung YANG, Tom K. Cho, Yu-Chi Yeh, Andrew Yu +1 more | 2021-08-17 |
| 11047035 | Protective yttria coating for semiconductor equipment parts | Ramesh Gopalan, Yixing Lin, Tasnuva Tabassum, Yikai Chen, Kevin A. PAPKE | 2021-06-29 |
| 10460941 | Plasma doping using a solid dopant source | Qi Gao, Helen L. Maynard | 2019-10-29 |
| 7722737 | Gas distribution system for improved transient phase deposition | Sudhir Gondhalekar, Robert Duncan, Muhammad M. Rasheed, Harry Whitesell, Bruno Geoffrion +2 more | 2010-05-25 |
| 7571698 | Low-frequency bias power in HDP-CVD processes | Rongping Wang, Canfeng Lai, Yuri Trachuk | 2009-08-11 |
| 7147719 | Double slit-valve doors for plasma processing | Michael Welch, Homgqing Shan, Paul Luscher, Evans Lee, James D. Carducci | 2006-12-12 |
| 6958112 | Methods and systems for high-aspect-ratio gapfill using atomic-oxygen generation | M. Ziaul Karim, Farhad Moghadam | 2005-10-25 |
| 6899111 | Configurable single substrate wet-dry integrated cluster cleaner | Paul Luscher, James D. Carducci, Michael Welch | 2005-05-31 |
| 6863835 | Magnetic barrier for plasma in chamber exhaust | James D. Carducci, Hamid Noorbakhsh, Evans Lee, Hongqing Shan, Paul Luscher +1 more | 2005-03-08 |
| 6822185 | Temperature controlled dome-coil system for high power inductively coupled plasma systems | Michael Welch, Paul Luscher, Rolf Guenther, Zhong Qiang Hua, Son M. Phi +1 more | 2004-11-23 |
| 6797639 | Dielectric etch chamber with expanded process window | James D. Carducci, Hamid Noorbakhsh, Evans Lee, Bryan Pu, Hongching Shan +3 more | 2004-09-28 |
| 6773544 | Magnetic barrier for plasma in chamber exhaust | James D. Carducci, Hamid Noorbakhsh, Evans Lee, Hongqing Shan, Paul Luscher +1 more | 2004-08-10 |
| 6716302 | Dielectric etch chamber with expanded process window | James D. Carducci, Hamid Noorbakhsh, Evans Lee, Bryan Pu, Hongching Shan +3 more | 2004-04-06 |
| 6647918 | Double slit-valve doors for plasma processing | Michael Welch, Homgqing Shan, Paul Luscher, Evans Lee, James D. Carducci | 2003-11-18 |
| 6589361 | Configurable single substrate wet-dry integrated cluster cleaner | Paul Luscher, James D. Carducci | 2003-07-08 |
| 6575622 | Correction of wafer temperature drift in a plasma reactor based upon continuous wafer temperature measurements using an in-situ wafer temperature optical probe | Hamid Norrbakhsh, Mike Welch, Paul Luscher, Brad L. Mays | 2003-06-10 |
| 6432259 | Plasma reactor cooled ceiling with an array of thermally isolated plasma heated mini-gas distribution plates | Hamid Noorbakhsh, Michael Welch, Paul Luscher, Hongching Shan, Kaushik Vaidya +2 more | 2002-08-13 |
| 6373679 | ELECTROSTATIC OR MECHANICAL CHUCK ASSEMBLY CONFERRING IMPROVED TEMPERATURE UNIFORMITY ONTO WORKPIECES HELD THEREBY, WORKPIECE PROCESSING TECHNOLOGY AND/OR APPARATUS CONTAINING THE SAME, AND METHOD(S) FOR HOLDING AND/OR PROCESSING A WORKPIECE WITH THE SAME | Jianmin Qiao, James E. Nulty, Paul Arleo | 2002-04-16 |
| 6353210 | Correction of wafer temperature drift in a plasma reactor based upon continuous wafer temperature measurements using and in-situ wafer temperature optical probe | Hamid Norrbakhsh, Mike Welch, Paul Luscher, Brad L. Mays | 2002-03-05 |