Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7685705 | Method of fabricating a probe card | James Hunter, Alexander Herrera | 2010-03-30 |
| 7332921 | Probe card and method for constructing same | James Hunter, Alexander Herrera | 2008-02-19 |
| 7112975 | Advanced probe card and method of fabricating same | Bo Jin | 2006-09-26 |
| 6890860 | Method for etching and/or patterning a silicon-containing layer | Tinghao Wang, Usha Raghuram | 2005-05-10 |
| 6847218 | Probe card with an adapter layer for testing integrated circuits | Brenor L. Brophy, Thomas A. McCleary, Bo Jin, Qi Gu, Thurman J. Rodgers +1 more | 2005-01-25 |
| 6784552 | Structure having reduced lateral spacer erosion | Christopher J. Petti | 2004-08-31 |
| 6406640 | Plasma etching method | Chan-Lon Yang, Usha Raghuram, Kimberley A. Kaufman, Daniel Arnzen | 2002-06-18 |
| 6373679 | ELECTROSTATIC OR MECHANICAL CHUCK ASSEMBLY CONFERRING IMPROVED TEMPERATURE UNIFORMITY ONTO WORKPIECES HELD THEREBY, WORKPIECE PROCESSING TECHNOLOGY AND/OR APPARATUS CONTAINING THE SAME, AND METHOD(S) FOR HOLDING AND/OR PROCESSING A WORKPIECE WITH THE SAME | Jianmin Qiao, Paul Arleo, Siamak Salimian | 2002-04-16 |
| 6372634 | Plasma etch chemistry and method of improving etch control | Jianmin Qiao, Sanjay Thekdi, Manuj Rathor | 2002-04-16 |
| 6214743 | Method and structure for making self-aligned contacts | Jianmin Oiao | 2001-04-10 |
| 6165375 | Plasma etching method | Chan-Lon Yang, Usha Raghuram, Kimberley A. Kaufman, Daniel Arnzen | 2000-12-26 |
| 6066555 | Method for eliminating lateral spacer erosion on enclosed contact topographies during RF sputter cleaning | Christopher J. Petti | 2000-05-23 |
| 5562801 | Method of etching an oxide layer | — | 1996-10-08 |
| 5468342 | Method of etching an oxide layer | Pamela Trammel | 1995-11-21 |
| 5441596 | Method for forming a stable plasma | — | 1995-08-15 |
| 5045149 | Method and apparatus for end point detection | — | 1991-09-03 |
| 5013400 | Dry etch process for forming champagne profiles, and dry etch apparatus | Howard Kurasaki, Barbara F. Westlund, E. John Vowles | 1991-05-07 |
| 4954212 | Endpoint detection system and method for plasma etching | Calvin T. Gabriel | 1990-09-04 |