Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of etching an oxide layer

Method of etching an oxide layer

US Patent 5468342 · Granted Nov 21, 1995

Estimated economic value: $5,265,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method of fabricating a probe card2010
Methods to reduce polarization dependent loss in planar lightwave circuits2009
Methods to reduce polarization dependent loss in planar lightwave circuits2008
Probe card and method for constructing same2008
Advanced probe card and method of fabricating same2006
Method for etching and/or patterning a silicon-containing layer2005
Probe card with an adapter layer for testing integrated circuits2005
Structure having reduced lateral spacer erosion2004
Planar lightwave circuit active device metallization process2004
Method and system for reducing dn/dt birefringence in a thermo-optic PLC device2004
Method of forming local oxidation with sloped silicon recess2003
Plasma etching method2002