Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7183222 | Dual damascene structure and method of making | — | 2007-02-27 |
| 6865065 | Semiconductor processing chamber substrate holder method and structure | Jiong Chen, Jihliang Chen | 2005-03-08 |
| 6803318 | Method of forming self aligned contacts | Sam Geha, Mehran Sedigh | 2004-10-12 |
| 6734108 | Semiconductor structure and method of making contacts in a semiconductor structure | Bo Jin, Shahin Sharifzadeh | 2004-05-11 |
| 6693042 | Method for etching a dielectric layer formed upon a barrier layer | Mehran Sedigh, Sam Geha | 2004-02-17 |
| 6635566 | Method of making metallization and contact structures in an integrated circuit | Alain Blosse, Sanjay Thedki, Yitzhak Gilboa | 2003-10-21 |
| 6579420 | Apparatus and method for uniformly depositing thin films over substrates | Zhimin Wan, Jiong Chen, Peiching Ling | 2003-06-17 |
| 6399512 | Method of making metallization and contact structures in an integrated circuit comprising an etch stop layer | Alain Blosse, Sanjay Thedki, Yitzhak Gilboa | 2002-06-04 |
| 6375744 | Sequential in-situ heating and deposition of halogen-doped silicon oxide | Laxman Murugesh, Maciek Orczyk, Pravin Narawankar, Turgut Sahin | 2002-04-23 |
| 6372634 | Plasma etch chemistry and method of improving etch control | Sanjay Thekdi, Manuj Rathor, James E. Nulty | 2002-04-16 |
| 6373679 | ELECTROSTATIC OR MECHANICAL CHUCK ASSEMBLY CONFERRING IMPROVED TEMPERATURE UNIFORMITY ONTO WORKPIECES HELD THEREBY, WORKPIECE PROCESSING TECHNOLOGY AND/OR APPARATUS CONTAINING THE SAME, AND METHOD(S) FOR HOLDING AND/OR PROCESSING A WORKPIECE WITH THE SAME | James E. Nulty, Paul Arleo, Siamak Salimian | 2002-04-16 |
| 6350665 | Semiconductor structure and method of making contacts and source and/or drain junctions in a semiconductor device | Bo Jin | 2002-02-26 |
| 6322716 | Method for conditioning a plasma etch chamber | Sanjay Thekdi | 2001-11-27 |
| 6228781 | Sequential in-situ heating and deposition of halogen-doped silicon oxide | Laxman Murugesh, Maciek Orczyk, Pravin Narawankar, Turgut Sahin | 2001-05-08 |
| 6136685 | High deposition rate recipe for low dielectric constant films | Pravin K. Narwankar, Laxman Murugesh, Turgut Sahin, Maciek Orczyk | 2000-10-24 |
| 5976900 | Method of reducing impurity contamination in semiconductor process chambers | Guofu J. Feng | 1999-11-02 |
| 5885356 | Method of reducing residue accumulation in CVD chamber using ceramic lining | Jun Zhao, Tom K. Cho, Xin Sheng Guo, Atsushi Tabata, Alex Schreiber | 1999-03-23 |