| 8796843 |
RF and milimeter-wave high-power semiconductor device |
Dubravko Babic, Quentin Diduck |
2014-08-05 |
| 6444040 |
Gas distribution plate |
Harald Herchen, David Palagashvili, Dmitry Lubomirsky |
2002-09-03 |
| 6270859 |
Plasma treatment of titanium nitride formed by chemical vapor deposition |
Jun Zhao, Ashok Sinha, Avi Tepman, Mei Chang, Lee Luo +4 more |
2001-08-07 |
| 6129044 |
Apparatus for substrate processing with improved throughput and yield |
Jun Zhao, Ashok Sinha, Avi Tepman, Mei Chang, Lee Luo +4 more |
2000-10-10 |
| 5964947 |
Removable pumping channel liners within a chemical vapor deposition chamber |
Jun Zhao, Ashok Sinha, Avi Tepman, Mei Chang, Lee Luo +4 more |
1999-10-12 |
| 5885356 |
Method of reducing residue accumulation in CVD chamber using ceramic lining |
Jun Zhao, Tom K. Cho, Xin Sheng Guo, Atsushi Tabata, Jianmin Qiao |
1999-03-23 |
| 5882411 |
Faceplate thermal choke in a CVD plasma reactor |
Jun Zhao |
1999-03-16 |
| 5853607 |
CVD processing chamber |
Jun Zhao, Tom K. Cho, Charles Dornfest, Stefan Wolff, Kevin Fairbairn +2 more |
1998-12-29 |
| 5846332 |
Thermally floating pedestal collar in a chemical vapor deposition chamber |
Jun Zhao, Ashok Sinha, Avi Tepman, Mei Chang, Lee Luo +4 more |
1998-12-08 |
| 5558717 |
CVD Processing chamber |
Jun Zhao, Tom K. Cho, Charles Dornfest, Stefan Wolff, Kevin Fairbairn +2 more |
1996-09-24 |
