Issued Patents All Time
Showing 25 most recent of 32 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8336488 | Multi-station plasma reactor with multiple plasma regions | Aihua Chen, Yijun Liu, Jinyuan Chen, Tuqiang Ni, Gerald Yin +1 more | 2012-12-25 |
| 7745329 | Tungsten nitride atomic layer deposition processes | Shulin Wang, Ulrich Kroemer, Aihua Chen, Ming Li | 2010-06-29 |
| 7608300 | Methods and devices to reduce defects in dielectric stack structures | Christopher Dennis Bencher | 2009-10-27 |
| 7429516 | Tungsten nitride atomic layer deposition processes | Shulin Wang, Ulrich Kroemer, Aihua Chen, Ming Li | 2008-09-30 |
| 7335266 | Method of forming a controlled and uniform lightly phosphorous doped silicon film | Li Fu, Sheeba J. Panayil, Shulin Wang, Christopher Quentin, Aihua Chen +1 more | 2008-02-26 |
| 7115499 | Cyclical deposition of tungsten nitride for metal oxide gate electrode | Shulin Wang, Ulrich Kroemer, Aihua Chen, Ming Li | 2006-10-03 |
| 6982214 | Method of forming a controlled and uniform lightly phosphorous doped silicon film | Li Fu, Sheeba J. Panayil, Shulin Wang, Christopher Quentin, Aihua Chen +1 more | 2006-01-03 |
| 6949203 | System level in-situ integrated dielectric etch process particularly useful for copper dual damascene | Chang-Lin Hsieh, Diana Xiaobing Ma, Brian Sy-Yuan Shieh, Gerald Yin, Jennifer Y. Sun +2 more | 2005-09-27 |
| 6884464 | Methods for forming silicon comprising films using hexachlorodisilane in a single-wafer deposion chamber | R. Suryanarayanan Iyer, Janardhanan Anand Subramony, Errol Antonio C. Sanchez, Xiaoliang Jin, Aihua Chen +4 more | 2005-04-26 |
| 6833161 | Cyclical deposition of tungsten nitride for metal oxide gate electrode | Shulin Wang, Ulrich Kroemer, Aihua Chen, Ming Li | 2004-12-21 |
| 6802906 | Emissivity-change-free pumping plate kit in a single wafer chamber | Xiaoliang Jin, Shulin Wang, Henry Ho, Steven Chen | 2004-10-12 |
| 6793835 | System level in-situ integrated dielectric etch process particularly useful for copper dual damascene | Claes Bjorkman, Brian Sy-Yuan Shieh, Gerald Yin | 2004-09-21 |
| 6726955 | Method of controlling the crystal structure of polycrystalline silicon | Shulin Wang, Steven Chen, Errol Antonio C. Sanchez | 2004-04-27 |
| 6713127 | Methods for silicon oxide and oxynitride deposition using single wafer low pressure CVD | Janardhanan Anand Subramony, Yoshitaka Yokota, Ramaseshan Iyer, Aihua Chen | 2004-03-30 |
| 6582522 | Emissivity-change-free pumping plate kit in a single wafer chamber | Henry Ho, Shulin Wang, Binh Tran, Alexander Tam, Errol Antonio C. Sanchez +2 more | 2003-06-24 |
| 6566183 | Method of making a transistor, in particular spacers of the transistor | Steven Chen, Kegang Huang, Tzy-Tzan Fu, Kuan-Ting Lin, Hung-Chuan Chen | 2003-05-20 |
| 6559074 | Method of forming a silicon nitride layer on a substrate | Steven Chen, Xianzhi Tao, Shulin Wang, Kegang Huang, Sang-Hoon Ahn | 2003-05-06 |
| 6559039 | Doped silicon deposition process in resistively heated single wafer chamber | Shulin Wang, Steven Chen, Errol Antonio C. Sanchez, Xianzhi Tao, Zoran Dragojlovic +1 more | 2003-05-06 |
| 6500357 | System level in-situ integrated dielectric etch process particularly useful for copper dual damascene | Claes Bjorkman, Brian Sy-Yuan Shieh, Gerald Yin | 2002-12-31 |
| 6392290 | Vertical structure for semiconductor wafer-level chip scale packages | Y. Mohammed Kasem, Yueh-Se Ho, Chang-Sheng Chen, Eddy Tjhia, Bosco Lan +2 more | 2002-05-21 |
| 6270859 | Plasma treatment of titanium nitride formed by chemical vapor deposition | Jun Zhao, Ashok Sinha, Avi Tepman, Mei Chang, Alex Schreiber +4 more | 2001-08-07 |
| 6210485 | Chemical vapor deposition vaporizer | Jun Zhao, Xiaoliang Jin, Frank Chang, Charles Dornfest, Po Tang | 2001-04-03 |
| 6189482 | High temperature, high flow rate chemical vapor deposition apparatus and related methods | Jun Zhao, Xiao Liang Jin, Jia-Xiang Wang, Talex Sajoto, Stefan Wolff +2 more | 2001-02-20 |
| 6129044 | Apparatus for substrate processing with improved throughput and yield | Jun Zhao, Ashok Sinha, Avi Tepman, Mei Chang, Alex Schreiber +4 more | 2000-10-10 |
| 6077562 | Method for depositing barium strontium titanate | Charles Dornfest, Jun Zhao, Talex Sajoto | 2000-06-20 |