SW

Shulin Wang

Applied Materials: 27 patents #426 of 7,310Top 6%
AE Advanced Micro-Fabrication Equipment: 1 patents #26 of 61Top 45%
ZU Zhejiang University: 1 patents #773 of 2,379Top 35%
BS Bristol-Myers Squibb: 1 patents #2,477 of 3,969Top 65%
Overall (All Time): #124,772 of 4,157,543Top 4%
30
Patents All Time

Issued Patents All Time

Showing 25 most recent of 30 patents

Patent #TitleCo-InventorsDate
10167812 Radiation thermal absorber based on characteristic absorption spectrum, and stirling engine and operation method thereof Gang Xiao, Min Qiu, Mingjiang Ni, Qiang Li, Zhongyang Luo +1 more 2019-01-01
7972663 Method and apparatus for forming a high quality low temperature silicon nitride layer Errol Antonio C. Sanchez, Aihua Chen 2011-07-05
7745329 Tungsten nitride atomic layer deposition processes Ulrich Kroemer, Lee Luo, Aihua Chen, Ming Li 2010-06-29
7658800 Gas distribution assembly for use in a semiconductor work piece processing reactor Aihua Chen, Henry Ho, Gerald Yin, Qing Lv, Li Fu 2010-02-09
7611976 Gate electrode dopant activation method for semiconductor manufacturing Yi Ma, Khaled Ahmed, Kevin Cunningham, Robert C. McIntosh, Abhilash J. Mayur +6 more 2009-11-03
7429516 Tungsten nitride atomic layer deposition processes Ulrich Kroemer, Lee Luo, Aihua Chen, Ming Li 2008-09-30
7365029 Method for silicon nitride chemical vapor deposition R. Suryanarayanan Iyer, Sean M. Seutter, Sanjeev Tandon, Errol Antonio C. Sanchez 2008-04-29
7335266 Method of forming a controlled and uniform lightly phosphorous doped silicon film Li Fu, Sheeba J. Panayil, Christopher Quentin, Lee Luo, Aihua Chen +1 more 2008-02-26
7265036 Deposition of nano-crystal silicon using a single wafer chamber Sheeba J. Panayil, Ming Li, Jonathan Pickering 2007-09-04
7250268 Assay for measuring IκB kinase activity and identifying IκB kinase modulators James Burke 2007-07-31
7172792 Method for forming a high quality low temperature silicon nitride film Errol Antonio C. Sanchez, Aihua Chen 2007-02-06
7115499 Cyclical deposition of tungsten nitride for metal oxide gate electrode Ulrich Kroemer, Lee Luo, Aihua Chen, Ming Li 2006-10-03
7078302 Gate electrode dopant activation method for semiconductor manufacturing including a laser anneal Yi Ma, Khaled Ahmed, Kevin Cunningham, Robert C. McIntosh, Abhilash J. Mayur +6 more 2006-07-18
6991999 Bi-layer silicon film and method of fabrication Li Fu, Luo Lee, Steven Chen, Errol Antonio C. Sanchez 2006-01-31
6982214 Method of forming a controlled and uniform lightly phosphorous doped silicon film Li Fu, Sheeba J. Panayil, Christopher Quentin, Lee Luo, Aihua Chen +1 more 2006-01-03
6833161 Cyclical deposition of tungsten nitride for metal oxide gate electrode Ulrich Kroemer, Lee Luo, Aihua Chen, Ming Li 2004-12-21
6802906 Emissivity-change-free pumping plate kit in a single wafer chamber Xiaoliang Jin, Lee Luo, Henry Ho, Steven Chen 2004-10-12
6726955 Method of controlling the crystal structure of polycrystalline silicon Steven Chen, Lee Luo, Errol Antonio C. Sanchez 2004-04-27
6582522 Emissivity-change-free pumping plate kit in a single wafer chamber Lee Luo, Henry Ho, Binh Tran, Alexander Tam, Errol Antonio C. Sanchez +2 more 2003-06-24
6559039 Doped silicon deposition process in resistively heated single wafer chamber Lee Luo, Steven Chen, Errol Antonio C. Sanchez, Xianzhi Tao, Zoran Dragojlovic +1 more 2003-05-06
6559074 Method of forming a silicon nitride layer on a substrate Steven Chen, Xianzhi Tao, Lee Luo, Kegang Huang, Sang-Hoon Ahn 2003-05-06
6555183 Plasma treatment of a titanium nitride film formed by chemical vapor deposition Ming Xi, Zvi Lando, Mei Chang 2003-04-29
6548402 Method of depositing a thick titanium nitride film Ming Xi, Frederick Wu, Ramanujapuram A. Srinivas, Yehuda Demayo, Zvi Lando +2 more 2003-04-15
6524952 Method of forming a titanium silicide layer on a substrate Ramanujapuram A. Srinivas, Brian Metzger, Frederick Wu 2003-02-25
6488776 Method and apparatus for forming insitu boron doped polycrystalline and amorphous silicon films 2002-12-03