RS

Ramanujapuram A. Srinivas

Applied Materials: 9 patents #1,414 of 7,310Top 20%
CO Coherent: 3 patents #89 of 402Top 25%
RA Raydiance: 1 patents #18 of 25Top 75%
🗺 California: #46,935 of 386,348 inventorsTop 15%
Overall (All Time): #379,336 of 4,157,543Top 10%
13
Patents All Time

Issued Patents All Time

Showing 1–13 of 13 patents

Patent #TitleCo-InventorsDate
10239160 Systems and processes that singulate materials Michael Mielke, Tim Booth, Thor Miller Wilbanks 2019-03-26
9919380 Shaping of brittle materials with controlled surface and bulk properties David M. Gaudiosi, Timothy Booth, Michael Shirk, Eric Juban, Michael Mielke 2018-03-20
9120181 Singulation of layered materials using selectively variable laser output Michael Greenberg, David M. Gaudiosi, Michael Mielke, Tim Booth 2015-09-01
9114482 Laser based processing of layered materials Michael Greenberg, David M. Gaudiosi, Michael Mielke, Tim Booth 2015-08-25
6573181 Method of forming contact structures using nitrogen trifluoride preclean etch process and a titanium chemical vapor deposition step Mohan K. Bhan, Jennifer Kopp 2003-06-03
6548402 Method of depositing a thick titanium nitride film Shulin Wang, Ming Xi, Frederick Wu, Yehuda Demayo, Zvi Lando +2 more 2003-04-15
6524952 Method of forming a titanium silicide layer on a substrate Brian Metzger, Shulin Wang, Frederick Wu 2003-02-25
6432479 Method for in-situ, post deposition surface passivation of a chemical vapor deposited film Mei Chang, Li Wu 2002-08-13
6242347 Method for cleaning a process chamber Anand Vasudev, Toshio Itoh, Frederick Wu, Li Wu, Brian Boyle +1 more 2001-06-05
6193813 Utilization of SiH4 soak and purge in deposition processes Meng Chu Tseng, Mei Chang, Klaus-Dieter Rinnen, Moshe Eizenberg, Susan Telford 2001-02-27
5940733 Method of making polysilicon/tungsten silicide multilayer composite on an integrated circuit structure Israel Beinglass 1999-08-17
5817576 Utilization of SiH.sub.4 soak and purge in deposition processes Meng Chu Tseng, Mei Chang, Klaus-Dieter Rinnen, Moshe Eizenberg, Susan Telford 1998-10-06
5780360 Purge in silicide deposition processes dichlorosilane Jennifer Meng Chu Tseng, Mei Chang, Klaus-Dieter Rinnen, Moshe Eizenberg, Susan Telford 1998-07-14