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2003-06-03 |
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Chemical vapor deposition of copper using profiled distribution of showerhead apertures |
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2002-06-25 |
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Method for treating a deposited film for resistivity reduction |
Ling Chen, Bo Zheng, Justin Jones, Seshadri Ganguli, Timothy E. Levine +2 more |
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Chemical vapor deposition hardware and process |
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2001-10-02 |
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Method and apparatus for improving the film quality of plasma enhanced CVD films at the interface |
Anand Gupta, Virendra V. Rana, Amrita Verma, Sudhakar Subrahmanyam |
2001-09-18 |
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Method and apparatus for improving the film quality of plasma enhanced CVD films at the interface |
Anand Gupta, Virendra V. Rana, Amrita Verma, Sudhakar Subrahmanyam |
2001-09-18 |
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Film to tie up loose fluorine in the chamber after a clean process |
Anand Gupta, Sudhakar Subrahmanyam |
2001-05-01 |
| 6121163 |
Method and apparatus for improving the film quality of plasma enhanced CVD films at the interface |
Anand Gupta, Virendra V. Rana, Amrita Verma, Sudhakar Subrahmanyam |
2000-09-19 |
| 6090167 |
Method and apparatus for improving film stability of halogen-doped silicon oxide films |
Sudhakar Subrahmanyam, Anand Gupta, Viren V. S. Rana |
2000-07-18 |
| 6050506 |
Pattern of apertures in a showerhead for chemical vapor deposition |
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2000-04-18 |
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Film to tie up loose fluorine in the chamber after a clean process |
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2000-02-01 |
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Method and apparatus for improving film stability of halogen-doped silicon oxide films |
Sudhakar Subrahmanyam, Anand Gupta, Viren V. S. Rana |
1999-12-14 |
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Method for improving film stability of fluorosilicate glass films |
Sudhakar Subrahmanyam, Anand Gupta, Virendra V. Rana |
1998-10-27 |