Issued Patents All Time
Showing 25 most recent of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12119367 | Composite substrate for fabricating III-V photodetector arrays | Rehan Kapadia, Frank Greer | 2024-10-15 |
| 9722049 | Methods for forming crystalline IGZO with a seed layer | Sang Lee, Youn-Gyoung Chang, Min-Cheol Kim, Minh Huu Le, Kwon-Sik Park +1 more | 2017-08-01 |
| 9441298 | Devices including metal-silicon contacts using indium arsenide films and apparatus and methods | Prabu Gopalraja, Atif Noori, Mei Chang | 2016-09-13 |
| 9373516 | Method and apparatus for forming gate stack on Si, SiGe or Ge channels | Steven C. H. Hung, Kaushal K. Singh, Sundar Ramamurthy | 2016-06-21 |
| 9246013 | IGZO devices with composite channel layers and methods for forming the same | — | 2016-01-26 |
| 9245743 | Methods for forming high-k dielectrics containing hafnium and zirconium using atomic layer deposition | Frank Greer | 2016-01-26 |
| 9190320 | Devices including metal-silicon contacts using indium arsenide films and apparatus and methods | Prabu Gopalraja, Atif Noori, Mei Chang | 2015-11-17 |
| 9177791 | Systems and methods for forming semiconductor devices | — | 2015-11-03 |
| 9136355 | Methods for forming amorphous silicon thin film transistors | — | 2015-09-15 |
| 9093264 | Methods and apparatus for forming silicon passivation layers on germanium or III-V semiconductor devices | — | 2015-07-28 |
| 9082729 | Combinatorial method for solid source doping process development | — | 2015-07-14 |
| 9082793 | IGZO devices with reduced threshhold voltage shift and methods for forming the same | — | 2015-07-14 |
| 9076641 | Ultra-low resistivity contacts | — | 2015-07-07 |
| 9076651 | Gate stacks and ohmic contacts for SiC devices | Frank Greer, Raj Jammy | 2015-07-07 |
| 8993058 | Methods and apparatus for forming tantalum silicate layers on germanium or III-V semiconductor devices | Jeffrey W. Anthis | 2015-03-31 |
| 8975706 | Gate stacks including TaXSiYO for MOSFETS | Frank Greer | 2015-03-10 |
| 8906709 | Combinatorially variable etching of stacks including two dissimilar materials for etch pit density inspection | Frank Greer, George Mirth, Zhi-Wen Sun | 2014-12-09 |
| 8043907 | Atomic layer deposition processes for non-volatile memory devices | Yi Ma, Shreyas Kher, Tejal Goyani, Maitreyee Mahajani, Jallepally Ravi +1 more | 2011-10-25 |
| 7910446 | Integrated scheme for forming inter-poly dielectrics for non-volatile memory devices | Yi Ma, Shreyas Kher | 2011-03-22 |
| 7902018 | Fluorine plasma treatment of high-k gate stack for defect passivation | Philip Allan Kraus, Christopher S. Olsen | 2011-03-08 |
| 7888217 | Method for fabricating a gate dielectric of a field effect transistor | Thai Cheng Chua, Cory Czarnik, Christopher S. Olsen, Philip Allan Kraus | 2011-02-15 |
| 7871942 | Methods for manufacturing high dielectric constant film | Shreyas Kher, Pravin K. Narwankar, Yi Ma | 2011-01-18 |
| 7863193 | Integrated circuit fabrication process using a compression cap layer in forming a silicide with minimal post-laser annealing dopant deactivation | Yi Ma, Philip Allan Kraus, Christopher S. Olsen, Abhilash J. Mayur | 2011-01-04 |
| 7737036 | Integrated circuit fabrication process with minimal post-laser annealing dopant deactivation | Yi Ma, Philip Allan Kraus, Christopher S. Olsen, Abhilash J. Mayur | 2010-06-15 |
| 7727828 | Method for fabricating a gate dielectric of a field effect transistor | Thai Cheng Chua, Cory Czarnik, Andreas Hegedus, Christopher S. Olsen, Philip Allan Kraus | 2010-06-01 |