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Methods for depositing fluorine/carbon-free conformal tungsten |
Xinyu Fu, Srinivas Gandikota, Avgerinos V. Gelatos, Mei Chang, David Thompson +1 more |
2024-01-30 |
| 10985023 |
Methods for depositing fluorine/carbon-free conformal tungsten |
Xinyu Fu, Srinivas Gandikota, Avgerinos V. Gelatos, Mei Chang, David Thompson +1 more |
2021-04-20 |
| 9683287 |
Deposition of films comprising aluminum alloys with high aluminum content |
David Thompson, Srinivas Gandikota, Xinliang Lu, Wei V. Tang, Jing Zhou +6 more |
2017-06-20 |
| 9607920 |
Self-limiting chemical vapor deposition and atomic layer deposition methods |
Mary Edmonds, Andrew C. Kummel |
2017-03-28 |
| 9601339 |
Methods for depositing fluorine/carbon-free conformal tungsten |
Xinyu Fu, Srinivas Gandikota, Avgerinos V. Gelatos, Mei Chang, David Thompson +1 more |
2017-03-21 |
| 9441298 |
Devices including metal-silicon contacts using indium arsenide films and apparatus and methods |
Khaled Ahmed, Prabu Gopalraja, Mei Chang |
2016-09-13 |
| 9443728 |
Accelerated relaxation of strain-relaxed epitaxial buffers by use of integrated or stand-alone thermal processing |
Swaminathan Srinivasan, David K. Carlson |
2016-09-13 |
| 9305780 |
Self-limiting chemical vapor deposition and atomic layer deposition methods |
Mary Edmonds, Andrew C. Kummel |
2016-04-05 |
| 9269584 |
N-metal film deposition with initiation layer |
Seshadri Ganguli, Xinliang Lu, Maitreyee Mahajani, Shih Chung Chen, Mei Chang |
2016-02-23 |
| 9269574 |
Methods of fabricating dielectric films from metal amidinate precursors |
Steven C. H. Hung, David Thompson, Yoshihide Senzaki |
2016-02-23 |
| 9230815 |
Methods for depositing fluorine/carbon-free conformal tungsten |
Xinyu Fu, Srinivas Gandikota, Avgerinos V. Gelatos, Mei Chang, David Thompson +1 more |
2016-01-05 |
| 9190320 |
Devices including metal-silicon contacts using indium arsenide films and apparatus and methods |
Khaled Ahmed, Prabu Gopalraja, Mei Chang |
2015-11-17 |
| 9145612 |
Deposition of N-metal films comprising aluminum alloys |
Srinivas Gandikota, Xinliang Lu, Shih Chung Chen, Wei V. Tang, Jing Zhou +8 more |
2015-09-29 |
| 9082702 |
Atomic layer deposition methods for metal gate electrodes |
Yu Lei, Srinivas Gandikota, Xinyu Fu, Wei V. Tang |
2015-07-14 |
| 8987080 |
Methods for manufacturing metal gates |
Xinliang Lu, Seshadri Ganguli, Maitreyee Mahajani, Shih Chung Chen, Yu Lei +3 more |
2015-03-24 |
| 8927059 |
Deposition of metal films using alane-based precursors |
Xinliang Lu, David Thompson, Jeffrey W. Anthis, Mei Chang, Seshadri Ganguli +2 more |
2015-01-06 |
| 8927438 |
Methods for manufacturing high dielectric constant films |
Hyungjun Kim, Woo-Hee Kim, Min-Kyu Kim, Steven C. H. Hung, David Thompson +1 more |
2015-01-06 |
| 8895443 |
N-metal film deposition with initiation layer |
Seshadri Ganguli, Xinliang Lu, Maitreyee Mahajani, Shih Chung Chen, Mei Chang |
2014-11-25 |
| 8592305 |
Doping aluminum in tantalum silicide |
Xinliang Lu, Seshadri Ganguli, Shih Chung Chen, Maitreyee Mahajani, Mei Chang |
2013-11-26 |
| 8501568 |
Method of forming flash memory with ultraviolet treatment |
Mihaela Balseanu, Vladimir Zubkov, Li-Qun Xia, Reza Arghavani, Derek R. Witty +1 more |
2013-08-06 |
| 8252653 |
Method of forming a non-volatile memory having a silicon nitride charge trap layer |
Mihaela Balseanu, Vladimir Zubkov, Li-Qun Xia, Reza Arghavani, Derek R. Witty +1 more |
2012-08-28 |
| 7816205 |
Method of forming non-volatile memory having charge trap layer with compositional gradient |
Mihaela Balseanu, Vladimir Zubkov, Li-Qun Xia, Reza Arghavani, Derek R. Witty +1 more |
2010-10-19 |
