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Avgerinos V. Gelatos

Applied Materials: 65 patents #104 of 7,310Top 2%
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71
Patents All Time

Issued Patents All Time

Showing 1–25 of 71 patents

Patent #TitleCo-InventorsDate
12406849 Methods and apparatus for enhancing selectivity of titanium and titanium silicides during chemical vapor deposition Takashi Kuratomi, I-Cheng Chen, Pingyan Lei, Mei Chang, Xianmin Tang 2025-09-02
12356705 Electrical contact cavity structure and methods of forming the same Nicolas L. Breil, Lisa McGill, Manoj Vellaikal, Bocheng Cao, Pei Liu 2025-07-08
12347695 Methods for controlling contact resistance in cobalt-titanium structures Takashi Kuratomi, Tae Hong Ha, Xuesong Lu, Szuheng Ho, Wei Lei +3 more 2025-07-01
12293902 Process kit for a substrate support Muhannad Mustafa, Muhammad M. Rasheed, Yu Lei, Vikash Banthia, Victor H Calderon +3 more 2025-05-06
12281387 Method of depositing metal films Feng Q. Liu, Mark Saly, David Thompson, Annamalai Lakshmanan, Joung Joo Lee 2025-04-22
12094785 Dual silicide process using ruthenium silicide Thomas Anthony Empante, Zhibo Yuan, Liqi Wu, Joung Joo Lee, Byunghoon Yoon 2024-09-17
11887855 Methods for depositing fluorine/carbon-free conformal tungsten Xinyu Fu, Srinivas Gandikota, Atif Noori, Mei Chang, David Thompson +1 more 2024-01-30
11776806 Multi-step pre-clean for selective metal gap fill Xi Cen, Yakuan Yao, Yiming Lai, Kai Wu, David T. Or +8 more 2023-10-03
11658014 Apparatuses and methods of protecting nickel and nickel containing components with thin films Pingyan Lei, Dien-Yeh Wu, Xiao-Ming He, Jennifer Y. Sun, Lei Zhou +3 more 2023-05-23
11598003 Substrate processing chamber having heated showerhead assembly Faruk Gungor, Dien-Yeh Wu, Joel M. Huston, Mei Chang, Xiaoxiong Yuan +4 more 2023-03-07
11430661 Methods and apparatus for enhancing selectivity of titanium and titanium silicides during chemical vapor deposition Takashi Kuratomi, I-Cheng Chen, Pingyan Lei, Mei Chang, Xianmin Tang 2022-08-30
11424132 Methods and apparatus for controlling contact resistance in cobalt-titanium structures Takashi Kuratomi, Tae Hong Ha, Xuesong Lu, Szuheng Ho, Wei Lei +3 more 2022-08-23
11387134 Process kit for a substrate support Muhannad Mustafa, Muhammad M. Rasheed, Yu Lei, Vikash Banthia, Victor H Calderon +3 more 2022-07-12
11380536 Multi-step pre-clean for selective metal gap fill Xi Cen, Yakuan Yao, Yiming Lai, Kai Wu, David T. Or +8 more 2022-07-05
11355391 Method for forming a metal gapfill Xi Cen, Feiyue Ma, Kai Wu, Yu Lei, Kazuya Daito +13 more 2022-06-07
11114320 Processing system and method of forming a contact Gaurav Thareja, Takashi Kuratomi, Xianmin Tang, Sanjay Natarajan, Keyvan Kashefizadeh +3 more 2021-09-07
10985023 Methods for depositing fluorine/carbon-free conformal tungsten Xinyu Fu, Srinivas Gandikota, Atif Noori, Mei Chang, David Thompson +1 more 2021-04-20
10770300 Remote hydrogen plasma titanium deposition to enhance selectivity and film uniformity Takashi Kuratomi, I-Cheng Chen, Faruk Gungor 2020-09-08
10699946 Method of enabling seamless cobalt gap-fill Bhushan Zope, Bo Zheng, Yu Lei, Xinyu Fu, Srinivas Gandikota +2 more 2020-06-30
10615034 Pre-clean of silicon germanium for pre-metal contact at source and drain and pre-high K at channel Bo Zheng, Anshul Ashok Vyas, Raymond Hung 2020-04-07
10535527 Methods for depositing semiconductor films Yi Xu, Takashi Kuratomi, Vikash Banthia, Mei Chang, Kazuya Daito 2020-01-14
10418246 Remote hydrogen plasma titanium deposition to enhance selectivity and film uniformity Takashi Kuratomi, I-Cheng Chen, Faruk Gungor 2019-09-17
10269633 Method of enabling seamless cobalt gap-fill Bhushan Zope, Bo Zheng, Yu Lei, Xinyu Fu, Srinivas Gandikota +2 more 2019-04-23
10256076 Substrate processing apparatus and methods Shi Wei Toh, Vikash Banthia 2019-04-09
10199230 Methods for selective deposition of metal silicides via atomic layer deposition cycles Seshadri Ganguli, Yixiong Yang, Bhushan Zope, Xinyu Fu, Guoqiang Jian +1 more 2019-02-05