Issued Patents All Time
Showing 25 most recent of 61 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12406884 | Self field-suppression CVD tungsten (W) fill on PVD W liner | Zhimin QI, Yi Xu, Shirish A. PETHE, Xingyao GAO, Shiyu YUE +5 more | 2025-09-02 |
| D1089130 | Process chamber manifold | Geraldine VASQUEZ, Shreyas Patil Shanthaveeraswamy, Mehran Behdjat, Jallepally Ravi, Yu Lei +3 more | 2025-08-19 |
| 12387975 | Thermal process chamber lid with backside pumping | Anqing Cui, Wei V. Tang, Yixiong Yang, Bo Wang | 2025-08-12 |
| 12272659 | Methods for forming metal gapfill with low resistivity | Yi Xu, Yu Lei, Zhimin QI, Aixi ZHANG, Xianyuan ZHAO +8 more | 2025-04-08 |
| 12230479 | Processing chamber with multiple plasma units | Kazuya Daito, Yi Xu, Yu Lei, Takashi Kuratomi, Jallepally Ravi +1 more | 2025-02-18 |
| 12016092 | Gas distribution ceramic heater for deposition chamber | Pingyan Lei, Jallepally Ravi, Manjunatha Koppa, Ambarish Toorihal, Sandesh Yadamane +2 more | 2024-06-18 |
| D1027120 | Seal for an assembly in a vapor deposition chamber | Yao-Hung YANG, Eric Ruhland, Saurabh M. Chaudhari, Philip Wayne Nagle, Aniruddha Pal +4 more | 2024-05-14 |
| 11955381 | Low-temperature plasma pre-clean for selective gap fill | Yi Xu, Yufei Hu, Kazuya Daito, Geraldine VASQUEZ, Da He +2 more | 2024-04-09 |
| 11955319 | Processing chamber with multiple plasma units | Kazuya Daito, Yi Xu, Yu Lei, Takashi Kuratomi, Jallepally Ravi +1 more | 2024-04-09 |
| 11721542 | Dual plasma pre-clean for selective gap fill | Yi Xu, Yufei Hu, Kazuya Daito, Yu Lei, Jallepally Ravi | 2023-08-08 |
| 11715667 | Thermal process chamber lid with backside pumping | Anqing Cui, Wei V. Tang, Yixiong Yang, Bo Wang | 2023-08-01 |
| 11658014 | Apparatuses and methods of protecting nickel and nickel containing components with thin films | Pingyan Lei, Xiao-Ming He, Jennifer Y. Sun, Lei Zhou, Takashi Kuratomi +3 more | 2023-05-23 |
| 11598003 | Substrate processing chamber having heated showerhead assembly | Faruk Gungor, Joel M. Huston, Mei Chang, Xiaoxiong Yuan, Kazuya Daito +4 more | 2023-03-07 |
| 11555244 | High temperature dual chamber showerhead | Pingyan Lei, Jallepally Ravi, Takashi Kuratomi, Xiaoxiong Yuan, Manjunatha Koppa +1 more | 2023-01-17 |
| 11421322 | Blocker plate for use in a substrate process chamber | Xiaoxiong Yuan, Yu Lei, Yi Xu, Kazuya Daito, Pingyan Lei +2 more | 2022-08-23 |
| 11335591 | Thermal process chamber lid with backside pumping | Anqing Cui, Wei V. Tang, Yixiong Yang, Bo Wang | 2022-05-17 |
| RE48994 | Apparatus and method for providing uniform flow of gas | Joseph Yudovsky, Mei Chang, Faruk Gungor, Paul F. Ma, David Chu +2 more | 2022-03-29 |
| 11133155 | Apparatus for depositing metal films with plasma treatment | Daping Yao, Hyman Lam, John C. Forster, Jiang Lu, Can Xu +2 more | 2021-09-28 |
| 10982326 | Counter-flow multi inject for atomic layer deposition chamber | Paul F. Ma, Guodan Wei, Chun-Teh Kao | 2021-04-20 |
| 10879090 | High temperature process chamber lid | Ilker Durukan, Joel M. Huston, Chien-Teh Kao, Mei Chang | 2020-12-29 |
| 10640870 | Gas feedthrough assembly | Daping Yao, Hyman Lam, Jiang Lu, Can Xu, Paul F. Ma +1 more | 2020-05-05 |
| 10508339 | Blocker plate for use in a substrate process chamber | Xiaoxiong Yuan, Yu Lei, Yi Xu, Kazuya Daito, Pingyan Lei +2 more | 2019-12-17 |
| 10487399 | Atomic layer deposition chamber with counter-flow multi inject | Paul F. Ma, Guodan Wei, Chun-Teh Kao | 2019-11-26 |
| 10453657 | Apparatus for depositing metal films with plasma treatment | Daping Yao, Hyman Lam, John C. Forster, Jiang Lu, Can Xu +2 more | 2019-10-22 |
| 10407771 | Atomic layer deposition chamber with thermal lid | Anqing Cui, Faruk Gungor, Vikas Jangra, Muhammad M. Rasheed, Wei V. Tang +6 more | 2019-09-10 |