Issued Patents All Time
Showing 25 most recent of 51 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12394595 | Multi-antenna unit for large area inductively coupled plasma processing apparatus | ShouQian Shao, Tae Kyung Won, Jianhua Zhou | 2025-08-19 |
| 12362149 | Film stress control for plasma enhanced chemical vapor deposition | Tae Kyung Won, Carl A. Sorensen, Sanjay Yadav, Young Dong LEE, Shinichi Kurita +1 more | 2025-07-15 |
| 11854771 | Film stress control for plasma enhanced chemical vapor deposition | Tae Kyung Won, Carl A. Sorensen, Sanjay Yadav, Young Dong LEE, Shinichi Kurita +1 more | 2023-12-26 |
| 11664216 | ALD process and hardware with improved purge efficiency | Xiangxin Rui | 2023-05-30 |
| 11306393 | Methods and apparatus for ALD processes | Jeffrey A. Kho, Jianhua Zhou | 2022-04-19 |
| RE48994 | Apparatus and method for providing uniform flow of gas | Joseph Yudovsky, Mei Chang, Faruk Gungor, Paul F. Ma, David Chu +2 more | 2022-03-29 |
| 11094508 | Film stress control for plasma enhanced chemical vapor deposition | Tae Kyung Won, Carl A. Sorensen, Sanjay Yadav, Young Dong LEE, Shinichi Kurita +1 more | 2021-08-17 |
| 10964533 | ALD process and hardware with improved purge efficiency | Xiangxin Rui | 2021-03-30 |
| 10879090 | High temperature process chamber lid | Ilker Durukan, Joel M. Huston, Dien-Yeh Wu, Mei Chang | 2020-12-29 |
| 10751765 | Remote plasma source cleaning nozzle for cleaning a gas distribution plate | Tae Kyung Won, Young Dong LEE, Soo Young Choi, Sanjay Yadav | 2020-08-25 |
| 10697062 | Gas flow guide design for uniform flow distribution and efficient purge | Jeffrey A. Kho, Xiangxin Rui, Jianhua Zhou, Shinichi Kurita, ShouQian Shao +1 more | 2020-06-30 |
| 10593539 | Support assembly | Joel M. Huston, Mei Chang, Xiaoxiong Yuan | 2020-03-17 |
| 10400335 | Dual-direction chemical delivery system for ALD/CVD chambers | Zhenbin Ge, Joel M. Huston, Mei Chang | 2019-09-03 |
| RE47440 | Apparatus and method for providing uniform flow of gas | Joseph Yudovsky, Mei Chang, Faruk Gungor, Paul F. Ma, David Chu +2 more | 2019-06-18 |
| 10312475 | CVD thin film stress control method for display application | Tae Kyung Won, Soo Young Choi, Sanjay Yadav, Carl A. Sorensen, Suhail Anwar +1 more | 2019-06-04 |
| 9982343 | Apparatus for providing plasma to a process chamber | Hyman Lam | 2018-05-29 |
| 9881787 | Deposition methods for uniform and conformal hybrid titanium oxide films | Benjamin Schmiege, Xuesong Lu, Juno Yu-Ting Huang, Yu Lei, Yung-Hsin Lee +7 more | 2018-01-30 |
| 9831109 | High temperature process chamber lid | Ilker Durukan, Joel M. Huston, Dien-Yeh Wu, Mei Chang | 2017-11-28 |
| 9765432 | Dual-direction chemical delivery system for ALD/CVD chambers | Zhenbin Ge, Joel M. Huston, Mei Chang | 2017-09-19 |
| 9627185 | Methods and apparatus for in-situ cleaning of a process chamber | Joel M. Huston, Nicholas R. Denny | 2017-04-18 |
| 9551070 | In-situ corrosion resistant substrate support coating | Mei-Ying Chang, Juno Yu-Ting Huang | 2017-01-24 |
| 9353440 | Dual-direction chemical delivery system for ALD/CVD chambers | Zhenbin Ge, Joel M. Huston, Mei Chang | 2016-05-31 |
| 9147578 | Contact clean by remote plasma and repair of silicide surface | Xinliang Lu, Chiukin Lai, Mei Chang | 2015-09-29 |
| 9109754 | Apparatus and method for providing uniform flow of gas | Joseph Yudovsky, Mei Chang, Faruk Gungor, Paul F. Ma, David Chu +2 more | 2015-08-18 |
| 9004006 | Process chamber lid design with built-in plasma source for short lifetime species | Hyman Lam, Mei Chang, David T. Or, Nicholas R. Denny, Xiaoxiong Yuan | 2015-04-14 |