| 12362149 |
Film stress control for plasma enhanced chemical vapor deposition |
Chien-Teh Kao, Tae Kyung Won, Carl A. Sorensen, Sanjay Yadav, Young Dong LEE +1 more |
2025-07-15 |
|
| 11854771 |
Film stress control for plasma enhanced chemical vapor deposition |
Chien-Teh Kao, Tae Kyung Won, Carl A. Sorensen, Sanjay Yadav, Young Dong LEE +1 more |
2023-12-26 |
$30,871,000 |
| 11600642 |
Layer stack for display applications |
Xiangxin Rui, Soo Young Choi, Yujia Zhai, Lai ZHAO |
2023-03-07 |
$32,704,000 |
| 11123837 |
Method of removal of sharp corners from diffuser plate |
Ilyoung Richard Hong, Lai ZHAO, Jianhua Zhou, Robin L. Tiner, Gaku Furuta +1 more |
2021-09-21 |
$69,558,000 |
| 11094508 |
Film stress control for plasma enhanced chemical vapor deposition |
Chien-Teh Kao, Tae Kyung Won, Carl A. Sorensen, Sanjay Yadav, Young Dong LEE +1 more |
2021-08-17 |
$63,158,000 |
| 11049887 |
Layer stack for display applications |
Xiangxin Rui, Soo Young Choi, Yujia Zhai, Lai ZHAO |
2021-06-29 |
$47,858,000 |
| 11049965 |
Semiconductor device and alternator using the same |
Masaki Shiraishi, Tetsuya Ishimaru, Junichi Sakano, Mutsuhiro Mori |
2021-06-29 |
|
| 11022032 |
Engine |
Masahiro Kontani, Kensuke Mori, Toshiaki Deguchi |
2021-06-01 |
$700,000 |
| 11012022 |
Inverter device and electric motor device using same |
Tetsuya Ishimaru, Junichi Sakano |
2021-05-18 |
|
| 10954833 |
Air cleaner |
Masahiro Kontani, Takeji Kawazumi, Toshiaki Deguchi, Kensuke Mori |
2021-03-23 |
$551,000 |
| 10697062 |
Gas flow guide design for uniform flow distribution and efficient purge |
Chien-Teh Kao, Jeffrey A. Kho, Xiangxin Rui, Jianhua Zhou, ShouQian Shao +1 more |
2020-06-30 |
$26,020,000 |
| 10655222 |
Thin film encapsulation processing system and process kit |
Srikanth V. RACHERLA, Suhas Bhoski, Xiangxin Rui |
2020-05-19 |
$40,373,000 |
| 10604846 |
Thin film encapsulation mask preheat and substrate buffer chamber |
Makoto Inagawa, Suhas Bhoski |
2020-03-31 |
$21,055,000 |
| 10487401 |
Diffuser temperature control |
Robin L. Tiner |
2019-11-26 |
$24,423,000 |
| 10453718 |
Slit valve door with moving mating part |
Mehran Behdjat, John M. White, Suhail Anwar, Makoto Inagawa |
2019-10-22 |
$16,291,000 |
| 10373809 |
Grooved backing plate for standing wave compensation |
Robin L. Tiner |
2019-08-06 |
$24,698,000 |
| 10312058 |
Plasma uniformity control by gas diffuser hole design |
Soo Young Choi, John M. White, Qunhua Wang, Li Hou, Ki Woon Kim +4 more |
2019-06-04 |
$18,308,000 |
| 10304761 |
Semiconductor device and alternator using same |
Kenya Kawano, Tetsuya Ishimaru, Takeshi TERAKAWA |
2019-05-28 |
|
| 10280510 |
Substrate support assembly with non-uniform gas flow clearance |
Robin L. Tiner |
2019-05-07 |
$13,988,000 |
| 10265868 |
Transfer robot with substrate cooling |
Makoto Inagawa, Takayuki Matsumoto |
2019-04-23 |
$20,753,000 |
| 10262837 |
Plasma uniformity control by gas diffuser hole design |
Soo Young Choi, John M. White, Qunhua Wang, Li Hou, Ki Woon Kim +4 more |
2019-04-16 |
$29,421,000 |
| 10205314 |
Rectifier including MOSFET and hold circuit that boosts gate voltage of MOSFET, and alternator using the same |
Tetsuya Ishimaru, Mutsuhiro Mori |
2019-02-12 |
|
| 10184179 |
Atomic layer deposition processing chamber permitting low-pressure tool replacement |
Jozef Kudela, John M. White, Dieter Haas |
2019-01-22 |
$28,931,000 |
| 10123379 |
Substrate support with quadrants |
Robin L. Tiner, Soo Young Choi, Beom Soo Park, Bora Oh, Gaku Furuta |
2018-11-06 |
$24,517,000 |
| 10079536 |
Rectifier, alternator using same and power supply using same |
Tetsuya Ishimaru, Takeshi TERAKAWA |
2018-09-18 |
|
