Issued Patents All Time
Showing 25 most recent of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12312689 | Large-area high-density plasma processing chamber for flat panel displays | Suhail Anwar, Yui Lun WU, Carl A. Sorensen, Jeevan Prakash SEQUEIRA | 2025-05-27 |
| 12224156 | Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-ALD) processing tool | Xiaopu Li, Kallol Bera, Tsutomu Tanaka, Dmitry A. Dzilno | 2025-02-11 |
| 11823871 | Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-ALD) processing tool | Tsutomu Tanaka, Alexander V. Garachtchenko, Dmitry A. Dzilno, Avinash Shervegar, Kallol Bera +3 more | 2023-11-21 |
| 11532418 | RF choke for gas delivery to an RF driven electrode in a plasma processing apparatus | Carl A. Sorensen, John M. White | 2022-12-20 |
| 10903048 | Substrate processing method and apparatus for controlling phase angles of harmonic signals | Yui Lun WU, Carl A. Sorensen, Suhail Anwar | 2021-01-26 |
| 10886053 | RF choke for gas delivery to an RF driven electrode in a plasma processing apparatus | Carl A. Sorensen, John M. White | 2021-01-05 |
| 10304607 | RF choke for gas delivery to an RF driven electrode in a plasma processing apparatus | Carl A. Sorensen, John M. White | 2019-05-28 |
| 10184179 | Atomic layer deposition processing chamber permitting low-pressure tool replacement | Shinichi Kurita, John M. White, Dieter Haas | 2019-01-22 |
| 10043638 | Compact configurable modular radio frequency matching network assembly for plasma processing systems | Ranjit Indrajit Shinde, Suhail Anwar | 2018-08-07 |
| 9922854 | Vertical inline CVD system | Shinichi Kurita, Suhail Anwar, John M. White, Dong-Kil Yim, Hans Georg Wolf +3 more | 2018-03-20 |
| 9827578 | Tightly fitted ceramic insulator on large area electrode | Jonghoon Baek, John M. White, Robin L. Tiner, Suhail Anwar, Gaku Furuta | 2017-11-28 |
| 9818580 | Transmission line RF applicator for plasma chamber | Tsutomu Tanaka, Carl A. Sorensen, Suhail Anwar, John M. White, Ranjit Indrajit Shinde +2 more | 2017-11-14 |
| 9761365 | RF choke for gas delivery to an RF driven electrode in a plasma processing apparatus | Carl A. Sorensen, John M. White | 2017-09-12 |
| 9425026 | Systems and methods for improved radio frequency matching networks | Suhail Anwar, Carl A. Sorensen | 2016-08-23 |
| 9397380 | Guided wave applicator with non-gaseous dielectric for plasma chamber | Tsutomu Tanaka, Carl A. Sorensen, Suhail Anwar, John M. White | 2016-07-19 |
| 9324597 | Vertical inline CVD system | Shinichi Kurita, Suhail Anwar, John M. White, Dong-Kil Yim, Hans Georg Wolf +3 more | 2016-04-26 |
| 9068262 | Tightly fitted ceramic insulator on large area electrode | Jonghoon Baek, John M. White, Robin L. Tiner, Suhail Anwar, Gaku Furuta | 2015-06-30 |
| 9048518 | Transmission line RF applicator for plasma chamber | Tsutomu Tanaka, Carl A. Sorensen, Suhail Anwar, John M. White, Ranjit Indrajit Shinde +2 more | 2015-06-02 |
| 8992723 | RF bus and RF return bus for plasma chamber electrode | Carl A. Sorensen, Robin L. Tiner, Suhail Anwar, John M. White | 2015-03-31 |
| 8906813 | SiOx process chemistry development using microwave plasma CVD | Tae Kyung Won, Seon-Mee Cho, Soo Young Choi, Beom Soo Park, Dong-Kil Yim +1 more | 2014-12-09 |
| 8883269 | Thin film deposition using microwave plasma | Tae Kyung Won, Helinda NOMINANDA, Seon-Mee Cho, Soo Young Choi, Beom Soo Park +2 more | 2014-11-11 |
| 8872428 | Plasma source with vertical gradient | Tsutomu Tanaka, Suhail Anwar, Carl A. Sorensen, John M. White | 2014-10-28 |
| 8728586 | RF choke for gas delivery to an RF driven electrode in a plasma processing apparatus | Carl A. Sorensen, John M. White | 2014-05-20 |
| 8691047 | Large area plasma processing chamber with at-electrode RF matching | Carl A. Sorensen, John M. White | 2014-04-08 |
| 8438990 | Multi-electrode PECVD source | John M. White | 2013-05-14 |