Issued Patents All Time
Showing 25 most recent of 34 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9935183 | Multilayer passivation or etch stop TFT | Dong-Kil Yim, Tae Kyung Won, John M. White | 2018-04-03 |
| 9818580 | Transmission line RF applicator for plasma chamber | Jozef Kudela, Tsutomu Tanaka, Carl A. Sorensen, Suhail Anwar, John M. White +2 more | 2017-11-14 |
| 9590113 | Multilayer passivation or etch stop TFT | Dong-Kil Yim, Tae Kyung Won, John M. White | 2017-03-07 |
| 9337030 | Method to grow in-situ crystalline IGZO using co-sputtering targets | Stuart Brinkley, Anh Duong, Majid Gharghi, Sang Lee, Minh Huu Le +2 more | 2016-05-10 |
| 9287137 | Methods for depositing a silicon containing layer with argon gas dilution | Qunhua Wang, Weijie Wang, Young Jin Choi, Yi Cui, Beom Soo Park +1 more | 2016-03-15 |
| 9245809 | Pin hole evaluation method of dielectric films for metal oxide semiconductor TFT | Dong-Kil Yim, Tae Kyung Won | 2016-01-26 |
| 9202690 | Methods for forming crystalline IGZO through annealing | Sang Lee, Stuart Brinkley, Yoon-Kyung Chang, Min-Cheol Kim, Kwon-Sik Park +1 more | 2015-12-01 |
| 9048518 | Transmission line RF applicator for plasma chamber | Jozef Kudela, Tsutomu Tanaka, Carl A. Sorensen, Suhail Anwar, John M. White +2 more | 2015-06-02 |
| 8906813 | SiOx process chemistry development using microwave plasma CVD | Tae Kyung Won, Soo Young Choi, Beom Soo Park, Dong-Kil Yim, John M. White +1 more | 2014-12-09 |
| 8883269 | Thin film deposition using microwave plasma | Tae Kyung Won, Helinda NOMINANDA, Soo Young Choi, Beom Soo Park, John M. White +2 more | 2014-11-11 |
| 8715788 | Method to improve mechanical strength of low-K dielectric film using modulated UV exposure | Ananda K. Bandyopadhyay, Haiying Fu, Easwar Srinivasan, David Mordo | 2014-05-06 |
| 8709924 | Method for conformal plasma immersed ion implantation assisted by atomic layer deposition | Hiroji Hanawa, Majeed A. Foad | 2014-04-29 |
| 8168519 | Plasma immersion ion implantation method using a pure or nearly pure silicon seasoning layer on the chamber interior surfaces | Shijian Li, Kartik Ramaswamy, Hiroji Hanawa, Biagio Gallo, Dongwon Choi +1 more | 2012-05-01 |
| 8043667 | Method to improve mechanical strength of low-K dielectric film using modulated UV exposure | Ananda K. Bandyopadhyay, Haiying Fu, Easwar Srinivasan, David Mordo | 2011-10-25 |
| 7968439 | Plasma immersion ion implantation method using a pure or nearly pure silicon seasoning layer on the chamber interior surfaces | Shijian Li, Kartik Ramaswamy, Hiroji Hanawa, Biagio Gallo, Dongwon Choi +1 more | 2011-06-28 |
| 7892985 | Method for porogen removal and mechanical strength enhancement of low-k carbon doped silicon oxide using low thermal budget microwave curing | George D. Papasouliotis, Mike Barnes | 2011-02-22 |
| 7871828 | In-situ dose monitoring using optical emission spectroscopy | Majeed A. Foad | 2011-01-18 |
| 7691755 | Plasma immersion ion implantation with highly uniform chamber seasoning process for a toroidal source reactor | Shijian Li, Lily Pang, Majeed A. Foad | 2010-04-06 |
| 7622162 | UV treatment of STI films for increasing tensile stress | Bart J. van Schravendijk | 2009-11-24 |
| 7611757 | Method to improve mechanical strength of low-K dielectric film using modulated UV exposure | Ananda K. Bandyopadhyay, Haiying Fu, Easwar Srinivasan, David Mordo | 2009-11-03 |
| 7589028 | Hydroxyl bond removal and film densification method for oxide films using microwave post treatment | Mike Barnes, Michelle T. Schulberg, George D. Papasouliotis | 2009-09-15 |
| 7531469 | Dosimetry using optical emission spectroscopy/residual gas analyzer in conjunction with ion current | Kartik Ramaswamy, Tsutomu Tanaka, Majeed A. Foad | 2009-05-12 |
| 7491653 | Metal-free catalysts for pulsed deposition layer process for conformal silica laminates | George D. Papasouliotis, Ron Rulkens, Mihai Buretea, Dennis M. Hausmann, Michael Barnes | 2009-02-17 |
| 7265061 | Method and apparatus for UV exposure of low dielectric constant materials for porogen removal and improved mechanical properties | Easwar Srinivasan, Brian Lu, David Mordo | 2007-09-04 |
| 7253125 | Method to improve mechanical strength of low-k dielectric film using modulated UV exposure | Ananda K. Bandyopadhyay, Haiying Fu, Easwar Srinivasan, David Mordo | 2007-08-07 |