Issued Patents All Time
Showing 25 most recent of 33 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8900405 | Plasma immersion ion implantation reactor with extended cathode process ring | Peter I. Porshnev, Majeed A. Foad, Kartik Ramaswamy, Hiroji Hanawa, Andrew Nguyen +2 more | 2014-12-02 |
| 8168519 | Plasma immersion ion implantation method using a pure or nearly pure silicon seasoning layer on the chamber interior surfaces | Shijian Li, Kartik Ramaswamy, Hiroji Hanawa, Seon-Mee Cho, Dongwon Choi +1 more | 2012-05-01 |
| 7989329 | Removal of surface dopants from a substrate | Kartik Ramaswamy, Kenneth S. Collins, Hiroji Hanawa, Majeed A. Foad, Martin A. Hilkene +2 more | 2011-08-02 |
| 7968439 | Plasma immersion ion implantation method using a pure or nearly pure silicon seasoning layer on the chamber interior surfaces | Shijian Li, Kartik Ramaswamy, Hiroji Hanawa, Seon-Mee Cho, Dongwon Choi +1 more | 2011-06-28 |
| 7732309 | Plasma immersed ion implantation process | Shijian Li, Kartik Ramaswamy, Dong-Hyung LEE, Majeed A. Foad | 2010-06-08 |
| 7700465 | Plasma immersion ion implantation process using a plasma source having low dissociation and low minimum plasma voltage | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Andrew Nguyen, Amir Al-Bayati +1 more | 2010-04-20 |
| 7666464 | RF measurement feedback control and diagnostics for a plasma immersion ion implantation reactor | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Amir Al-Bayati, Andrew Nguyen | 2010-02-23 |
| 7642180 | Semiconductor on insulator vertical transistor fabrication and doping process | Amir Al-Bayati, Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Andrew Nguyen | 2010-01-05 |
| 7465478 | Plasma immersion ion implantation process | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Andrew Nguyen, Amir Al-Bayati | 2008-12-16 |
| 7428915 | O-ringless tandem throttle valve for a plasma reactor chamber | Andrew Nguyen, Hiroji Hanawa, Kenneth S. Collins, Kartik Ramaswamy, Amir Al-Bayati | 2008-09-30 |
| 7429532 | Semiconductor substrate process using an optically writable carbon-containing mask | Kartik Ramaswamy, Hiroji Hanawa, Kenneth S. Collins, Kai Ma, Vijay Parihar +4 more | 2008-09-30 |
| 7422775 | Process for low temperature plasma deposition of an optical absorption layer and high speed optical annealing | Kartik Ramaswamy, Hiroji Hanawa, Kenneth S. Collins, Kai Ma, Vijay Parihar +4 more | 2008-09-09 |
| 7393765 | Low temperature CVD process with selected stress of the CVD layer on CMOS devices | Hiroji Hanawa, Kartik Ramaswamy, Kenneth S. Collins, Amir Al-Bayati, Andrew Nguyen | 2008-07-01 |
| 7335611 | Copper conductor annealing process employing high speed optical annealing with a low temperature-deposited optical absorber layer | Kartik Ramaswamy, Hiroji Hanawa, Kenneth S. Collins, Kai Ma, Vijay Parihar +4 more | 2008-02-26 |
| 7323401 | Semiconductor substrate process using a low temperature deposited carbon-containing hard mask | Kartik Ramaswamy, Hiroji Hanawa, Kenneth S. Collins, Kai Ma, Vijay Parihar +4 more | 2008-01-29 |
| 7320734 | Plasma immersion ion implantation system including a plasma source having low dissociation and low minimum plasma voltage | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Andrew Nguyen, Amir Al-Bayati +1 more | 2008-01-22 |
| 7312148 | Copper barrier reflow process employing high speed optical annealing | Kartik Ramaswamy, Hiroji Hanawa, Kenneth S. Collins, Kai Ma, Vijay Parihar +4 more | 2007-12-25 |
| 7312162 | Low temperature plasma deposition process for carbon layer deposition | Kartik Ramaswamy, Hiroji Hanawa, Kenneth S. Collins, Kai Ma, Vijay Parihar +4 more | 2007-12-25 |
| 7303982 | Plasma immersion ion implantation process using an inductively coupled plasma source having low dissociation and low minimum plasma voltage | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Andrew Nguyen, Amir Al-Bayati +1 more | 2007-12-04 |
| 7294563 | Semiconductor on insulator vertical transistor fabrication and doping process | Amir Al-Bayati, Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Andrew Nguyen | 2007-11-13 |
| 7292428 | Electrostatic chuck with smart lift-pin mechanism for a plasma reactor | Hiroji Hanawa, Andrew Nguyen, Kenneth S. Collins, Kartik Ramaswamy, Amir Al-Bayati | 2007-11-06 |
| 7291545 | Plasma immersion ion implantation process using a capacitively couple plasma source having low dissociation and low minimum plasma voltage | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Andrew Nguyen, Amir Al-Bayati +1 more | 2007-11-06 |
| 7288491 | Plasma immersion ion implantation process | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Andrew Nguyen, Amir Al-Bayati | 2007-10-30 |
| 7223676 | Very low temperature CVD process with independently variable conformality, stress and composition of the CVD layer | Hiroji Hanawa, Kartik Ramaswamy, Kenneth S. Collins, Amir Al-Bayati, Andrew Nguyen | 2007-05-29 |
| 7183177 | Silicon-on-insulator wafer transfer method using surface activation plasma immersion ion implantation for wafer-to-wafer adhesion enhancement | Amir Al-Bayati, Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Andrew Nguyen | 2007-02-27 |