Issued Patents All Time
Showing 25 most recent of 37 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12394604 | Plasma source with floating electrodes | Quoc Truong, Robert B. Moore | 2025-08-19 |
| 12317378 | Multi-zone heater control for wafer processing equipment | Uwe Haller, Kiyki-Shiy Shang | 2025-05-27 |
| 12288677 | Vertically adjustable plasma source | Tsutomu Tanaka, Jared Ahmad Lee, Rakesh Ramadas, Gregory J. Wilson, Sriharish Srinivasan | 2025-04-29 |
| 12224156 | Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-ALD) processing tool | Xiaopu Li, Jozef Kudela, Kallol Bera, Tsutomu Tanaka | 2025-02-11 |
| 12198908 | Magnetically coupled RF filter for substrate processing chambers | Edward P. Hammond, IV, Alexander V. Garachtchenko | 2025-01-14 |
| 12094748 | Bipolar esc with balanced RF impedance | Jian Li, Edward P. Hammond, IV, Juan Carlos Rocha-Alvarez, Wenhao Zhang | 2024-09-17 |
| 12080584 | Real time bias detection and correction for electrostatic chuck | Jian Li, Juan Carlos Rocha-Alvarez | 2024-09-03 |
| 12057339 | Bipolar electrostatic chuck to limit DC discharge | Jian Li, Juan Carlos Rocha-Alvarez, Zheng John Ye, Paul Brillhart | 2024-08-06 |
| 12040210 | Multi-pressure bipolar electrostatic chucking | Jian Li, Juan Carlos Rocha-Alvarez, Paul Brillhart, Akshay Gunaji, Mayur Govind Kulkarni +6 more | 2024-07-16 |
| 11956883 | Methods and apparatus for controlling RF parameters at multiple frequencies | Zheng John Ye, Daemian Raj Benjamin Raj, Shailendra Srivastava, Nikhil Sudhindrarao Jorapur, Ndanka O. Mukuti +1 more | 2024-04-09 |
| 11923172 | Paired dynamic parallel plate capacitively coupled plasmas | Hari Ponnekanti, Tsutomu Tanaka, Mandyam Sriram, Sanjeev Baluja, Mario David Silvetti | 2024-03-05 |
| 11901209 | High temperature bipolar electrostatic chuck | Jian Li, Zheng John Ye, Juan Carlos Rocha-Alvarez | 2024-02-13 |
| 11823871 | Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-ALD) processing tool | Jozef Kudela, Tsutomu Tanaka, Alexander V. Garachtchenko, Avinash Shervegar, Kallol Bera +3 more | 2023-11-21 |
| 11776793 | Plasma source with ceramic electrode plate | Robert B. Moore, Jared Ahmad Lee, Marc Shull, Tsutomu Tanaka, Alexander V. Garachtchenko | 2023-10-03 |
| 11776835 | Power supply signal conditioning for an electrostatic chuck | Zheng John Ye, Daemian Raj Benjamin Raj, Rana Howlader, Abhigyan Keshri, Sanjay Kamath +6 more | 2023-10-03 |
| 11705312 | Vertically adjustable plasma source | Tsutomu Tanaka, Jared Ahmad Lee, Rakesh Ramadas, Gregory J. Wilson, Sriharish Srinivasan | 2023-07-18 |
| 11631583 | RF power source operation in plasma enhanced processes | Farhad Moghadam, Hari Ponnekanti | 2023-04-18 |
| 11626853 | RF power delivery architecture with switchable match and frequency tuning | Edward P. Hammond, IV, Yury Trachuk | 2023-04-11 |
| 11594440 | Real time bias detection and correction for electrostatic chuck | Jian Li, Juan Carlos Rocha-Alvarez | 2023-02-28 |
| 11587817 | High temperature bipolar electrostatic chuck | Jian Li, Zheng John Ye, Juan Carlos Rocha-Alvarez | 2023-02-21 |
| 11570879 | Methods and apparatus for controlling RF parameters at multiple frequencies | Zheng John Ye, Daemian Raj Benjamin Raj, Shailendra Srivastava, Nikhil Sudhindrarao Jorapur, Ndanka O. Mukuti +1 more | 2023-01-31 |
| 11430680 | Position and temperature monitoring of ALD platen susceptor | Abraham Ravid, Kevin Griffin, Joseph Yudovsky, Kaushal Gangakhedkar, Alex Minkovich | 2022-08-30 |
| 11315763 | Shaped electrodes for improved plasma exposure from vertical plasma source | Kallol Bera, Anantha K. Subramani, John C. Forster, Tsutomu Tanaka | 2022-04-26 |
| 11282676 | Paired dynamic parallel plate capacitively coupled plasmas | Hari Ponnekanti, Tsutomu Tanaka, Mandyam Sriram, Sanjeev Baluja, Mario David Silvetti | 2022-03-22 |
| D938373 | Substrate transfer structure | Jason M. Schaller, Benjamin B. Riordon, Mitchell DiSanto, Paul Forderhase, Gary Wyka +7 more | 2021-12-14 |