Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
DD

Dmitry A. Dzilno — 37 Patents

Applied Materials: 37 patents #272 of 7,310Top 4%
Sunnyvale, CA: #568 of 14,302 inventorsTop 4%
California: #12,909 of 386,348 inventorsTop 4%
Overall (All Time): #88,321 of 4,157,543Top 3%
37 Patents All Time
Dmitry A. Dzilno has been granted 37 US patents while listed as an inventor at Applied Materials. The first was granted in 2014 and the most recent in August 2025. Dmitry A. Dzilno ranks #88,321 of 4,157,543 US inventors in our database (top 2.1%). Patent records list Dmitry A. Dzilno in Sunnyvale, CA, US.

Patents per Year

Patents granted per year, 2014 to 2025Bar chart with a peak of 9 patents in 2023.peak 92014: 1 patents20142016: 1 patents2017: 1 patents20172018: 1 patents2019: 3 patents20192020: 3 patents2021: 3 patents20212022: 3 patents2023: 9 patents20232024: 7 patents2025: 5 patents2025

Issued Patents All Time

Showing 1–25 of 37 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
12394604 Plasma source with floating electrodes Quoc Truong, Robert B. Moore 2025-08-19
12317378 Multi-zone heater control for wafer processing equipment Uwe Haller, Kiyki-Shiy Shang 2025-05-27
12288677 Vertically adjustable plasma source Tsutomu Tanaka, Jared Ahmad Lee, Rakesh Ramadas, Gregory J. Wilson, Sriharish Srinivasan 2025-04-29
12224156 Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-ALD) processing tool Xiaopu Li, Jozef Kudela, Kallol Bera, Tsutomu Tanaka 2025-02-11
12198908 Magnetically coupled RF filter for substrate processing chambers Edward P. Hammond, IV, Alexander V. Garachtchenko 2025-01-14
12094748 Bipolar esc with balanced RF impedance Jian Li, Edward P. Hammond, IV, Juan Carlos Rocha-Alvarez, Wenhao Zhang 2024-09-17 $46,375,000
12080584 Real time bias detection and correction for electrostatic chuck Jian Li, Juan Carlos Rocha-Alvarez 2024-09-03 $44,731,000
12057339 Bipolar electrostatic chuck to limit DC discharge Jian Li, Juan Carlos Rocha-Alvarez, Zheng John Ye, Paul Brillhart 2024-08-06 $90,312,000
12040210 Multi-pressure bipolar electrostatic chucking Jian Li, Juan Carlos Rocha-Alvarez, Paul Brillhart, Akshay Gunaji, Mayur Govind Kulkarni +6 more 2024-07-16 $116,305,000
11956883 Methods and apparatus for controlling RF parameters at multiple frequencies Zheng John Ye, Daemian Raj Benjamin Raj, Shailendra Srivastava, Nikhil Sudhindrarao Jorapur, Ndanka O. Mukuti +1 more 2024-04-09 $47,694,000
11923172 Paired dynamic parallel plate capacitively coupled plasmas Hari Ponnekanti, Tsutomu Tanaka, Mandyam Sriram, Sanjeev Baluja, Mario David Silvetti 2024-03-05 $73,319,000
11901209 High temperature bipolar electrostatic chuck Jian Li, Zheng John Ye, Juan Carlos Rocha-Alvarez 2024-02-13 $47,589,000
11823871 Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-ALD) processing tool Jozef Kudela, Tsutomu Tanaka, Alexander V. Garachtchenko, Avinash Shervegar, Kallol Bera +3 more 2023-11-21 $39,416,000
11776793 Plasma source with ceramic electrode plate Robert B. Moore, Jared Ahmad Lee, Marc Shull, Tsutomu Tanaka, Alexander V. Garachtchenko 2023-10-03 $34,462,000
11776835 Power supply signal conditioning for an electrostatic chuck Zheng John Ye, Daemian Raj Benjamin Raj, Rana Howlader, Abhigyan Keshri, Sanjay Kamath +6 more 2023-10-03 $34,462,000
11705312 Vertically adjustable plasma source Tsutomu Tanaka, Jared Ahmad Lee, Rakesh Ramadas, Gregory J. Wilson, Sriharish Srinivasan 2023-07-18 $58,990,000
11631583 RF power source operation in plasma enhanced processes Farhad Moghadam, Hari Ponnekanti 2023-04-18 $36,767,000
11626853 RF power delivery architecture with switchable match and frequency tuning Edward P. Hammond, IV, Yury Trachuk 2023-04-11 $32,726,000
11594440 Real time bias detection and correction for electrostatic chuck Jian Li, Juan Carlos Rocha-Alvarez 2023-02-28 $49,197,000
11587817 High temperature bipolar electrostatic chuck Jian Li, Zheng John Ye, Juan Carlos Rocha-Alvarez 2023-02-21 $24,540,000
11570879 Methods and apparatus for controlling RF parameters at multiple frequencies Zheng John Ye, Daemian Raj Benjamin Raj, Shailendra Srivastava, Nikhil Sudhindrarao Jorapur, Ndanka O. Mukuti +1 more 2023-01-31 $29,381,000
11430680 Position and temperature monitoring of ALD platen susceptor Abraham Ravid, Kevin Griffin, Joseph Yudovsky, Kaushal Gangakhedkar, Alex Minkovich 2022-08-30 $41,861,000
11315763 Shaped electrodes for improved plasma exposure from vertical plasma source Kallol Bera, Anantha K. Subramani, John C. Forster, Tsutomu Tanaka 2022-04-26 $43,127,000
11282676 Paired dynamic parallel plate capacitively coupled plasmas Hari Ponnekanti, Tsutomu Tanaka, Mandyam Sriram, Sanjeev Baluja, Mario David Silvetti 2022-03-22 $64,102,000
D938373 Substrate transfer structure Jason M. Schaller, Benjamin B. Riordon, Mitchell DiSanto, Paul Forderhase, Gary Wyka +7 more 2021-12-14