Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Magnetically coupled RF filter for substrate processing chambers

Magnetically coupled RF filter for substrate processing chambers

US Patent 12198908 · Granted Jan 14, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Plasma source with floating electrodes2025
Multi-zone heater control for wafer processing equipment2025
Vertically adjustable plasma source2025
Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-2025
Thin layer deposition with plasma pulsing2025
Electrostatic chuck with multiple radio frequency meshes to control plasma unifo2024
Plasma-enhanced chemical vapor deposition of carbon hard-mask2024
Bipolar esc with balanced RF impedance2024
Bipolar esc with balanced RF impedance2024
Control of liquid delivery in auto-refill systems2024
Real time bias detection and correction for electrostatic chuck2024
Bipolar electrostatic chuck to limit DC discharge2024