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Method for epitaxially depositing a material on a substrate by flowing a process gas across the substrate from an upper gas inlet to an upper gas outlet and flowing a purge gas from a lower gas inlet to a lower gas outlet |
Tetsuya Ishikawa, Swaminathan Srinivasan, Matthias Bauer, Manjunath Subbanna, Ala Moradian +4 more |
2024-09-17 |
| 12084763 |
Microstructure control of conducting materials through surface coating of powders |
Peter Reimer, Hong P. Gao, Chandra Deshpandey |
2024-09-10 |
| 11776793 |
Plasma source with ceramic electrode plate |
Robert B. Moore, Jared Ahmad Lee, Tsutomu Tanaka, Alexander V. Garachtchenko, Dmitry A. Dzilno |
2023-10-03 |
| 11111582 |
Porous showerhead for a processing chamber |
Sumit Agarwal, Chad Peterson |
2021-09-07 |
| 6506254 |
Semiconductor processing equipment having improved particle performance |
William Frederick Bosch, Stephen A. Dynan |
2003-01-14 |
