Issued Patents All Time
Showing 1–25 of 37 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12288677 | Vertically adjustable plasma source | Tsutomu Tanaka, Rakesh Ramadas, Dmitry A. Dzilno, Gregory J. Wilson, Sriharish Srinivasan | 2025-04-29 |
| 12094715 | Abatement and strip process chamber in a load lock configuration | Martin Jeffrey Salinas, Paul B. Reuter, Andrew Nguyen | 2024-09-17 |
| 11887856 | Enhanced spatial ALD of metals through controlled precursor mixing | Kelvin Chan, Yihong Chen, Kevin Griffin, Srinivas Gandikota, Joseph Yudovsky +1 more | 2024-01-30 |
| 11773479 | Plasma erosion resistant thin film coating for high temperature application | Vahid Firouzdor, Biraja P. Kanungo, Jennifer Y. Sun, Martin Jeff Salinas | 2023-10-03 |
| 11776793 | Plasma source with ceramic electrode plate | Robert B. Moore, Marc Shull, Tsutomu Tanaka, Alexander V. Garachtchenko, Dmitry A. Dzilno | 2023-10-03 |
| 11705312 | Vertically adjustable plasma source | Tsutomu Tanaka, Rakesh Ramadas, Dmitry A. Dzilno, Gregory J. Wilson, Sriharish Srinivasan | 2023-07-18 |
| 11583816 | Gas distribution plate for thermal deposition | Sanjeev Baluja, Joseph AuBuchon, Dhritiman Subha Kashyap, Michael R. Rice | 2023-02-21 |
| 11584993 | Thermally uniform deposition station | Sanjeev Baluja, Joseph AuBuchon, Kenneth Brian Doering, Dhritiman Subha Kashyap, Kartik Shah | 2023-02-21 |
| 11574831 | Method and apparatus for substrate transfer and radical confinement | Martin Jeffrey Salinas, Paul B. Reuter, Imad Yousif, Aniruddha Pal | 2023-02-07 |
| 11479855 | Spatial wafer processing with improved temperature uniformity | Joseph AuBuchon, Sanjeev Baluja, Dhritiman Subha Kashyap, Tejas Ulavi, Michael R. Rice | 2022-10-25 |
| 11177136 | Abatement and strip process chamber in a dual loadlock configuration | Martin Jeffrey Salinas, Paul B. Reuter, Imad Yousif, Aniruddha Pal | 2021-11-16 |
| 11171008 | Abatement and strip process chamber in a dual load lock configuration | Martin Jeffrey Salinas, Paul B. Reuter, Imad Yousif, Aniruddha Pal | 2021-11-09 |
| 11110425 | Gas distribution plate for thermal deposition | Sanjeev Baluja, Joseph AuBuchon, Dhritiman Subha Kashyap, Michael R. Rice | 2021-09-07 |
| 11043386 | Enhanced spatial ALD of metals through controlled precursor mixing | Kelvin Chan, Yihong Chen, Kevin Griffin, Srinivas Gandikota, Joseph Yudovsky +1 more | 2021-06-22 |
| 10943788 | Abatement and strip process chamber in a load lock configuration | Martin Jeffrey Salinas, Paul B. Reuter, Andrew Nguyen | 2021-03-09 |
| 10815562 | Plasma erosion resistant thin film coating for high temperature application | Vahid Firouzdor, Biraja P. Kanungo, Jennifer Y. Sun, Martin Jeff Salinas | 2020-10-27 |
| 10787739 | Spatial wafer processing with improved temperature uniformity | Joseph AuBuchon, Sanjeev Baluja, Dhritiman Subha Kashyap, Tejas Ulavi, Michael R. Rice | 2020-09-29 |
| 10566205 | Abatement and strip process chamber in a load lock configuration | Martin Jeffrey Salinas, Paul B. Reuter, Andrew Nguyen | 2020-02-18 |
| 10468282 | Method and apparatus for substrate transfer and radical confinement | Martin Jeff Salinas, Paul B. Reuter, Imad Yousif, Aniruddha Pal | 2019-11-05 |
| 10453694 | Abatement and strip process chamber in a dual loadlock configuration | Martin Jeffrey Salinas, Paul B. Reuter, Imad Yousif, Aniruddha Pal | 2019-10-22 |
| 10276354 | Segmented focus ring assembly | Paul B. Reuter | 2019-04-30 |
| 10204805 | Thin heated substrate support | Imad Yousif, Martin Jeffrey Salinas, Paul B. Reuter, Aniruddha Pal | 2019-02-12 |
| 10090181 | Method and apparatus for substrate transfer and radical confinement | Martin Jeffrey Salinas, Paul B. Reuter, Imad Yousif, Aniruddha Pal | 2018-10-02 |
| 10010912 | Particle reduction via throttle gate valve purge | Dmitry Lubomirsky, Martin Jeff Salinas, Andrew Nguyen, Tom K. Cho, Eric A. Englhardt +1 more | 2018-07-03 |
| 9976211 | Plasma erosion resistant thin film coating for high temperature application | Vahid Firouzdor, Biraja P. Kanungo, Jennifer Y. Sun, Martin Jeff Salinas | 2018-05-22 |