Issued Patents All Time
Showing 26–37 of 37 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9885567 | Substrate placement detection in semiconductor equipment using thermal response characteristics | Martin Jeffrey Salinas, Yi Zhou, Changhun Lee | 2018-02-06 |
| 9587789 | Methods and apparatus for providing a gas mixture to a pair of process chambers | Martin Jeffrey Salinas, Ezra Robert Gold, James P. Cruse | 2017-03-07 |
| 9464732 | Apparatus for uniform pumping within a substrate process chamber | Paul B. Reuter, Martin Jeffrey Salinas, Imad Yousif | 2016-10-11 |
| 8992689 | Method for removing halogen-containing residues from substrate | Adauto Diaz, Andrew Nguyen, Benjamin Schwarz, Eu Jin Lim, James P. Cruse +4 more | 2015-03-31 |
| 8845816 | Method extending the service interval of a gas distribution plate | Adauto Diaz, Andrew Nguyen, Benjamin Schwarz, Eu Jin Lim, James P. Cruse +4 more | 2014-09-30 |
| 8616043 | Methods and apparatus for calibrating pressure gauges in a substrate processing system | James P. Cruse, Ezra Robert Gold, Ming Xu | 2013-12-31 |
| 8616224 | Methods and apparatus for providing a gas mixture to a pair of process chambers | Martin Jeff Salinas, Ezra Robert Gold, James P. Cruse | 2013-12-31 |
| 8562742 | Apparatus for radial delivery of gas to a chamber and methods of use thereof | Martin Jeff Salinas, Ankur Agarwal, Ezra Robert Gold, James P. Cruse, Aniruddha Pal +1 more | 2013-10-22 |
| 8074677 | Method and apparatus for controlling gas flow to a processing chamber | Ezra Robert Gold, Richard Fovell, James P. Cruse, Bruno Geoffrion, Douglas A. Buchberger, Jr. +1 more | 2011-12-13 |
| 7975558 | Method and apparatus for gas flow measurement | Ezra Robert Gold, Chunlei Zhang, James P. Cruse, Richard Fovell | 2011-07-12 |
| 7846497 | Method and apparatus for controlling gas flow to a processing chamber | Ezra Robert Gold, Richard Fovell, James P. Cruse, Bruno Geoffrion, Douglas A. Buchberger, Jr. +1 more | 2010-12-07 |
| 7775236 | Method and apparatus for controlling gas flow to a processing chamber | Ezra Robert Gold, Richard Fovell, James P. Cruse, Bruno Geoffrion, Douglas A. Buchberger, Jr. +1 more | 2010-08-17 |