Issued Patents All Time
Showing 1–25 of 37 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12362158 | Method for OES data collection and endpoint detection | Blaze Messer, Yan Chen, Joel Ng, Ashawaraya Shalini, Ying Zhu +1 more | 2025-07-15 |
| 12306044 | Optical emission spectroscopy for advanced process characterization | Blaze Messer, Yan Chen, Joel Ng, Ashawaraya Shalini, Ying Zhu +1 more | 2025-05-20 |
| 12287578 | Cyclic method for reactive development of photoresists | Hamed Hajibabaeinajafabadi, Akiteru Ko, Yu-Hao Tsai | 2025-04-29 |
| 12158374 | Time-resolved OES data collection | Andrej Mitrovic, Blaze Messer, Yan Chen, Joel Ng, Ashawaraya Shalini +2 more | 2024-12-03 |
| 12009430 | Method for gate stack formation and etching | Christopher Catano, Sang Cheol Han, Shyam Sridhar, Yusuke Yoshida, Christopher Talone +1 more | 2024-06-11 |
| 12002683 | Lateral etching of silicon | Hamed Hajibabaeinajafabadi, Pingshan Luan, Aelan Mosden | 2024-06-04 |
| 11699741 | Metal-containing liner process | Yusuke Yoshida, Christopher Talone, Alok Ranjan | 2023-07-11 |
| 11651970 | Systems and methods for selective ion mass segregation in pulsed plasma atomic layer etching | — | 2023-05-16 |
| 11637242 | Methods for resistive RAM (ReRAM) performance stabilization via dry etch clean treatment | Qi Wang, Shyam Sridhar, Karsten BECKMANN, Martin Rodgers, Nathaniel Cady | 2023-04-25 |
| 11398386 | Plasma etch processes | Yusuke Yoshida, Shyam Sridhar, Caitlin Philippi, Christopher Talone, Alok Ranjan | 2022-07-26 |
| 11189462 | Ion stratification using bias pulses of short duration | — | 2021-11-30 |
| 11133194 | Method for selective etching at an interface between materials | Christopher Catano, Nicholas Joy, Alok Ranjan, Christopher Talone | 2021-09-28 |
| 10998170 | Method for ion mass separation and ion energy control in process plasmas | Yusuke Yoshida, Alok Ranjan, David J. Coumou, Scott E. White | 2021-05-04 |
| 10903077 | Methods to protect nitride layers during formation of silicon germanium nano-wires in microelectronic workpieces | Yusuke Yoshida, Christopher Catano, Christopher Talone, Nicholas Joy | 2021-01-26 |
| 10818482 | Methods for stability monitoring and improvements to plasma sources for plasma processing | Yusuke Yoshida, Jason Marion, Alok Ranjan | 2020-10-27 |
| 10814336 | Apparatus for treating gas | Mark Attwood, Andrew Arthur Chambers, John Leslie Bidder | 2020-10-27 |
| 10818502 | System and method of plasma discharge ignition to reduce surface particles | Jason Marion, Yusuke Yoshida, Alok Ranjan, Takashi Enomoto, Yoshio Ishikawa | 2020-10-27 |
| 10811273 | Methods of surface restoration for nitride etching | Christopher Talone, Erdinc Karakas, Andrew Nolan, Alok Ranjan | 2020-10-20 |
| 10811269 | Method to achieve a sidewall etch | Shyam Sridhar, Nayoung Bae, Alok Ranjan | 2020-10-20 |
| 10777385 | Method for RF power distribution in a multi-zone electrode array | Alok Ranjan | 2020-09-15 |
| 10651017 | Method for operation instability detection in a surface wave plasma source | Jason Marion, Alok Ranjan | 2020-05-12 |
| 10529540 | Advanced methods for plasma systems operation | Christopher Talone, Alok Ranjan | 2020-01-07 |
| 10237916 | Systems and methods for ESC temperature control | Alok Ranjan | 2019-03-19 |
| 10204832 | Method of patterning intersecting structures | Christopher Talone, Alok Ranjan | 2019-02-12 |
| 10115591 | Selective SiARC removal | Shyam Sridhar, Li Wang, Andrew Nolan, Hiroto Ohtake, Alok Ranjan | 2018-10-30 |