Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12424447 | Method to selectively etch silicon nitride to silicon oxide using water crystallization | Mingmei Wang, Du Zhang | 2025-09-23 |
| 12400863 | Method for etching for semiconductor fabrication | Du Zhang, Mingmei Wang, Takatoshi Orui, Motoi Takahashi, Masahiko Yokoi +2 more | 2025-08-26 |
| 12308212 | In-situ adsorbate formation for plasma etch process | Du Zhang, Masahiko Yokoi, Yoshihide Kihara, Mingmei Wang | 2025-05-20 |
| 12287578 | Cyclic method for reactive development of photoresists | Hamed Hajibabaeinajafabadi, Akiteru Ko, Sergey Voronin | 2025-04-29 |
| 12272558 | Selective and isotropic etch of silicon over silicon-germanium alloys and dielectrics; via new chemistry and surface modification | Matthew Flaugh, Jonathan Hollin, Subhadeep Kal, Pingshan Luan, Hamed Hajibabaeinajafabadi +1 more | 2025-04-08 |
| 11837471 | Methods of patterning small features | Katie Lutker-Lee, Jake Kaminsky, Angelique Raley, Mingmei Wang | 2023-12-05 |
| 11804380 | High-throughput dry etching of films containing silicon-oxygen components or silicon-nitrogen components by proton-mediated catalyst formation | Du Zhang, Mingmei Wang | 2023-10-31 |
| 11232954 | Sidewall protection layer formation for substrate processing | Mingmei Wang | 2022-01-25 |
| 11189499 | Atomic layer etch (ALE) of tungsten or other metal layers | Du Zhang, Mingmei Wang, Aelan Mosden, Matthew Flaugh | 2021-11-30 |
| 11158517 | Selective plasma etching of silicon oxide relative to silicon nitride by gas pulsing | Du Zhang, Mingmei Wang | 2021-10-26 |
| 11152217 | Highly selective silicon oxide/silicon nitride etching by selective boron nitride or aluminum nitride deposition | Du Zhang, Mingmei Wang | 2021-10-19 |
| 11024508 | Independent control of etching and passivation gas components for highly selective silicon oxide/silicon nitride etching | Du Zhang, Mingmei Wang | 2021-06-01 |