Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12424447 | Method to selectively etch silicon nitride to silicon oxide using water crystallization | Yu-Hao Tsai, Mingmei Wang | 2025-09-23 |
| 12400863 | Method for etching for semiconductor fabrication | Yu-Hao Tsai, Mingmei Wang, Takatoshi Orui, Motoi Takahashi, Masahiko Yokoi +2 more | 2025-08-26 |
| 12308212 | In-situ adsorbate formation for plasma etch process | Yu-Hao Tsai, Masahiko Yokoi, Yoshihide Kihara, Mingmei Wang | 2025-05-20 |
| 12237172 | Etch process for oxide of alkaline earth metal | Christophe Vallee, Mingmei Wang | 2025-02-25 |
| 12131914 | Selective etching with fluorine, oxygen and noble gas containing plasmas | Hojin Kim, Shigeru Tahara, Kaoru Maekawa, Mingmei Wang, Jacques Faguet +4 more | 2024-10-29 |
| 11804380 | High-throughput dry etching of films containing silicon-oxygen components or silicon-nitrogen components by proton-mediated catalyst formation | Yu-Hao Tsai, Mingmei Wang | 2023-10-31 |
| 11538692 | Cyclic plasma etching of carbon-containing materials | Yunho Kim, Shihsheng Chang, Mingmei Wang, Andrew Metz | 2022-12-27 |
| 11189499 | Atomic layer etch (ALE) of tungsten or other metal layers | Yu-Hao Tsai, Mingmei Wang, Aelan Mosden, Matthew Flaugh | 2021-11-30 |
| 11158517 | Selective plasma etching of silicon oxide relative to silicon nitride by gas pulsing | Yu-Hao Tsai, Mingmei Wang | 2021-10-26 |
| 11152217 | Highly selective silicon oxide/silicon nitride etching by selective boron nitride or aluminum nitride deposition | Yu-Hao Tsai, Mingmei Wang | 2021-10-19 |
| 11024508 | Independent control of etching and passivation gas components for highly selective silicon oxide/silicon nitride etching | Yu-Hao Tsai, Mingmei Wang | 2021-06-01 |