Issued Patents All Time
Showing 1–25 of 34 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12290835 | Methods for stabilization of self-assembled monolayers (SAMs) using sequentially pulsed initiated chemical vapor deposition (spiCVD) | Omid Zandi, Ornella Sathoud | 2025-05-06 |
| 12249515 | Etching method and etching apparatus | Shigeru Tahara, Kaoru Maekawa, Kumiko Ono, Nagisa Sato, Remi Dussart +3 more | 2025-03-11 |
| 12243752 | Systems for etching a substrate using a hybrid wet atomic layer etching process | Paul Abel | 2025-03-04 |
| 12131914 | Selective etching with fluorine, oxygen and noble gas containing plasmas | Du Zhang, Hojin Kim, Shigeru Tahara, Kaoru Maekawa, Mingmei Wang +4 more | 2024-10-29 |
| 12112959 | Processing systems and platforms for roughness reduction of materials using illuminated etch solutions | Omid Zandi | 2024-10-08 |
| 11915941 | Dynamically adjusted purge timing in wet atomic layer etching | Tetsuya Sakazaki, Paul Abel | 2024-02-27 |
| 11866831 | Methods for wet atomic layer etching of copper | Christopher NETZBAND, Paul Abel, Arkalgud R. Sitaram | 2024-01-09 |
| 11691175 | Methods for area-selective deposition of polymer films using sequentially pulsed initiated chemical vapor deposition (spiCVD) | Omid Zandi, Ornella Sathoud | 2023-07-04 |
| 11371143 | Implementing the post-porosity plasma protection (P4) process using I-CVD | Krystelle Lionti, Geraud Jean-Michel Dubois, Willi Volksen | 2022-06-28 |
| 11120999 | Plasma etching method | Koichi Yatsuda, Kaoru Maekawa, Nagisa Sato, Kumiko Ono, Shigeru Tahara +4 more | 2021-09-14 |
| 10896824 | Roughness reduction methods for materials using illuminated etch solutions | Omid Zandi | 2021-01-19 |
| 10818512 | Photo-assisted chemical vapor etch for selective removal of ruthenium | Omid Zandi | 2020-10-27 |
| 10115586 | Method for depositing a planarization layer using polymerization chemical vapor deposition | Bruce Altemus, Kazuya Ichiki | 2018-10-30 |
| 9212420 | Chemical vapor deposition method | Eric M. Lee, Raymond Nicholas Vrtis, Mark Leonard O'Neill, Patrick T. Hurley, Takashi Matsumoto +1 more | 2015-12-15 |
| 9157152 | Vapor deposition system | Eric M. Lee | 2015-10-13 |
| 9139910 | Method for chemical vapor deposition control | Eric M. Lee, Eric J. Strang | 2015-09-22 |
| 8916055 | Method and device for controlling pattern and structure formation by an electric field | Jozef Brcka, Eric M. Lee, Hongyu Yue | 2014-12-23 |
| 8895942 | Dielectric treatment module using scanning IR radiation source | Junjun Liu, Eric M. Lee, Dorel I. Toma, Hongyu Yue | 2014-11-25 |
| 8852347 | Apparatus for chemical vapor deposition control | Eric M. Lee, Eric J. Strang | 2014-10-07 |
| 8815014 | Method and system for performing different deposition processes within a single chamber | Masahide Iwasaki, Toshihisa Nozawa | 2014-08-26 |
| 8291856 | Gas heating device for a vapor deposition system | Ronald Nasman, Patrick Jay Biel | 2012-10-23 |
| 8272347 | High temperature gas heating device for a vapor deposition system | Ronald Nasman | 2012-09-25 |
| 8242460 | Ultraviolet treatment apparatus | Hongyu Yue, Junjun Liu, Dorel I. Toma | 2012-08-14 |
| 8163087 | Plasma enhanced atomic layer deposition system and method | Frank M. Cerio, Jr., Tsukasa Matsuda, Kaoru Yamamoto | 2012-04-24 |
| 7959985 | Method of integrating PEALD Ta-containing films into Cu metallization | Tadahiro Ishizaka, Tsukasa Matsuda, Masamichi Hara, Yasushi Mizusawa | 2011-06-14 |