Issued Patents All Time
Showing 25 most recent of 62 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11745202 | Dry non-plasma treatment system | Martin Kent | 2023-09-05 |
| 9139910 | Method for chemical vapor deposition control | Eric M. Lee, Jacques Faguet | 2015-09-22 |
| 9115429 | Dry non-plasma treatment system and method of using | Martin Kent | 2015-08-25 |
| 8927907 | Thermally zoned substrate holder assembly | Steven Fink | 2015-01-06 |
| 8877000 | Shower head gas injection apparatus with secondary high pressure pulsed gas injection | — | 2014-11-04 |
| 8852347 | Apparatus for chemical vapor deposition control | Eric M. Lee, Jacques Faguet | 2014-10-07 |
| 8828185 | Dry non-plasma treatment system and method of using | Martin Kent | 2014-09-09 |
| 8562743 | Method and apparatus for atomic layer deposition | — | 2013-10-22 |
| 8296687 | System and method for using first-principles simulation to analyze a process performed by a semiconductor processing tool | Andrej Mitrovic | 2012-10-23 |
| 8207476 | Temperature controlled substrate holder with non-uniform insulation layer for a substrate processing system | Yuji Tsukamoto | 2012-06-26 |
| 8092602 | Thermally zoned substrate holder assembly | Steven Fink | 2012-01-10 |
| 8073667 | System and method for using first-principles simulation to control a semiconductor manufacturing process | Andrej Mitrovic | 2011-12-06 |
| 8050900 | System and method for using first-principles simulation to provide virtual sensors that facilitate a semiconductor manufacturing process | Andrej Mitrovic | 2011-11-01 |
| 8038834 | Method and system for controlling radical distribution | Merritt Funk, David V. Horak, Lee Chen | 2011-10-18 |
| 8036869 | System and method for using first-principles simulation to control a semiconductor manufacturing process via a simulation result or a derived empirical model | Andrej Mitrovic | 2011-10-11 |
| 8032348 | System and method for using first-principles simulation to facilitate a semiconductor manufacturing process | Andrej Mitrovic | 2011-10-04 |
| 8014991 | System and method for using first-principles simulation to characterize a semiconductor manufacturing process | Andrej Mitrovic | 2011-09-06 |
| 7740704 | High rate atomic layer deposition apparatus and method of using | — | 2010-06-22 |
| 7732227 | Method and apparatus for wall film monitoring | Richard Parsons | 2010-06-08 |
| 7723648 | Temperature controlled substrate holder with non-uniform insulation layer for a substrate processing system | Yuji Tsukamoto | 2010-05-25 |
| 7718032 | Dry non-plasma treatment system and method of using | Martin Kent | 2010-05-18 |
| 7718030 | Method and system for controlling radical distribution | Merritt Funk, David V. Horak, Lee Chen | 2010-05-18 |
| 7666479 | Apparatus and method of gas injection sequencing | — | 2010-02-23 |
| 7582186 | Method and apparatus for an improved focus ring in a plasma processing system | Steven Fink | 2009-09-01 |
| 7563328 | Method and apparatus for gas injection system with minimum particulate contamination | — | 2009-07-21 |