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Method and system for controlling radical distribution |
Merritt Funk, Eric J. Strang, Lee Chen |
2011-10-18 |
| 7718030 |
Method and system for controlling radical distribution |
Merritt Funk, Eric J. Strang, Lee Chen |
2010-05-18 |
| 7585614 |
Sub-lithographic imaging techniques and processes |
Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, Charles W. Koburger, III, Peter H. Mitchell +2 more |
2009-09-08 |
| 7502660 |
Feature dimension deviation correction system, method and program product |
Wesley C. Natzle, Merritt Funk, Kevin Lally, Daniel Prager |
2009-03-10 |
| 7289864 |
Feature dimension deviation correction system, method and program product |
Wesley C. Natzle, Merritt Funk, Kevin Lally, Daniel Prager |
2007-10-30 |
| 7027125 |
System and apparatus for photolithography |
Mark C. Hakey, Charles W. Koburger, III, Peter H. Mitchell |
2006-04-11 |
| 6387596 |
Method of forming resist images by periodic pattern removal |
Daniel C. Cole, Edward W. Conrad, Randy W. Mann, Paul W. Pastel, Jed H. Rankin +1 more |
2002-05-14 |
| 6342323 |
Alignment methodology for lithography |
William H. Ma, Toshiharu Furukawa, Steven J. Holmes, Mark C. Hakey |
2002-01-29 |
| 6338921 |
Mask with linewidth compensation and method of making same |
James A. Bruce, Randy W. Mann, Jed H. Rankin, Andrew J. Watts |
2002-01-15 |
| 6268908 |
Micro adjustable illumination aperture |
Orest Bula, Daniel C. Cole, Edward W. Conrad, Jed H. Rankin |
2001-07-31 |
| 6014422 |
Method for varying x-ray hybrid resist space dimensions |
Diane C. Boyd, Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, William H. Ma +1 more |
2000-01-11 |
| 5173452 |
Process for the vapor deposition of polysilanes photoresists |
David M. Dobuzinsky, Mark C. Hakey, Steven J. Holmes |
1992-12-22 |