Issued Patents All Time
Showing 25 most recent of 34 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8619236 | Determining lithographic set point using optical proximity correction verification simulation | James A. Bruce, Jacek G. Smolinski | 2013-12-31 |
| 8219964 | Method for creating electrically testable patterns | James A. Bruce, Jacek G. Smolinski | 2012-07-10 |
| 7627622 | System and method of curve fitting | James C. Douglas, Shawn R. Goddard, John S. Smyth | 2009-12-01 |
| 7492941 | Mask defect analysis system | James A. Bruce, Orest Bula, William C. Leipold, Michael S. Hibbs, Joshua J. Krueger | 2009-02-17 |
| 7492940 | Mask defect analysis system | James A. Bruce, Orest Bula, William C. Leipold, Michael S. Hibbs, Joshua J. Krueger | 2009-02-17 |
| 7257247 | Mask defect analysis system | James A. Bruce, Orest Bula, William C. Leipold, Michael S. Hibbs, Joshua J. Krueger | 2007-08-14 |
| 7171319 | Method and apparatus to separate field and grid parameters on first level wafers | Paul D. Sonntag | 2007-01-30 |
| 6965808 | System and method for optimizing metrology sampling in APC applications | Craig E. Schneider, John S. Smyth, Daniel Sullivan | 2005-11-15 |
| 6949458 | Self-aligned contact areas for sidewall image transfer formed conductors | Chung H. Lam, Dale W. Martin, Edmund J. Sprogis | 2005-09-27 |
| 6922600 | System and method for optimizing manufacturing processes using real time partitioned process capability analysis | Craig E. Schneider, John S. Smyth, Daniel Sullivan | 2005-07-26 |
| 6879719 | Method for measurement of full-two dimensional submicron shapes | David P. Paul | 2005-04-12 |
| 6735492 | Feedback method utilizing lithographic exposure field dimensions to predict process tool overlay settings | John S. Smyth, Charles A. Whiting, David A. Ziemer | 2004-05-11 |
| 6704695 | Interactive optical proximity correction design method | Orest Bula, Daniel C. Cole, William C. Leipold | 2004-03-09 |
| 6694498 | Feed-forward lithographic overlay offset method and system | Charles J. Parrish, Charles A. Whiting | 2004-02-17 |
| 6667136 | Method to control nested to isolated line printing | Orest Bula, Daniel C. Cole, William C. Leipold | 2003-12-23 |
| 6566759 | Self-aligned contact areas for sidewall image transfer formed conductors | Chung H. Lam, Dale W. Martin, Edmund J. Sprogis | 2003-05-20 |
| 6539321 | Method for edge bias correction of topography-induced linewidth variation | James A. Bruce, Orest Bula, William C. Leipold | 2003-03-25 |
| 6528219 | Dynamic alignment scheme for a photolithography system | Paul D. Sonntag, Arthur C. Winslow | 2003-03-04 |
| 6458493 | Method to control nested to isolated line printing | Orest Bula, Daniel C. Cole, William C. Leipold | 2002-10-01 |
| 6429469 | Optical Proximity Correction Structures Having Decoupling Capacitors | Archibald J. Allen, Orest Bula, John M. Cohn, Daniel C. Cole, William C. Leipold | 2002-08-06 |
| 6425112 | Auto correction of error checked simulated printed images | Orest Bula, Daniel C. Cole, William C. Leipold | 2002-07-23 |
| 6395438 | Method of etch bias proximity correction | James A. Bruce, Orest Bula, William C. Leipold | 2002-05-28 |
| 6387596 | Method of forming resist images by periodic pattern removal | Daniel C. Cole, David V. Horak, Randy W. Mann, Paul W. Pastel, Jed H. Rankin +1 more | 2002-05-14 |
| 6383719 | Process for enhanced lithographic imaging | Orest Bula, Daniel C. Cole, Stephen E. Knight, Robert K. Leidy | 2002-05-07 |
| 6373975 | Error checking of simulated printed images with process window effects included | Orest Bula, Daniel C. Cole, William C. Leipold | 2002-04-16 |