| 6944578 |
Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus |
Reginald R. Bowley, Jr., Vincent J. Carlos, James Doran, Robert K. Leidy, Keith J. Machia +2 more |
2005-09-13 |
| 6917901 |
Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus |
Reginald R. Bowley, Jr., Vincent J. Carlos, James Doran, Robert K. Leidy, Keith J. Machia +2 more |
2005-07-12 |
| 6766507 |
Mask/wafer control structure and algorithm for placement |
James A. Bruce, Joshua J. Krueger, Matthew Nicholls, Jed H. Rankin |
2004-07-20 |
| 6383719 |
Process for enhanced lithographic imaging |
Orest Bula, Daniel C. Cole, Edward W. Conrad, Robert K. Leidy |
2002-05-07 |
| 6278515 |
Method and apparatus for adjusting a tilt of a lithography tool |
Charles A. Whiting |
2001-08-21 |
| 5486267 |
Method for applying photoresist |
Stephen E. Luce, Thomas L. McDevitt |
1996-01-23 |
