| 8619236 |
Determining lithographic set point using optical proximity correction verification simulation |
Edward W. Conrad, Jacek G. Smolinski |
2013-12-31 |
$6,686,000 |
| 8577489 |
Diagnosing in-line critical dimension control adjustments using optical proximity correction verification |
Kenneth T. Settlemyer, Jr. |
2013-11-05 |
$5,290,000 |
| 8499260 |
Optical proximity correction verification accounting for mask deviations |
Kenneth T. Settlemyer, Jr. |
2013-07-30 |
$15,502,000 |
| 8219964 |
Method for creating electrically testable patterns |
Edward W. Conrad, Jacek G. Smolinski |
2012-07-10 |
$6,782,000 |
| 8166423 |
Photomask design verification |
Scott M. Mansfield, Gregory J. Dick, Ioana Graur |
2012-04-24 |
$8,319,000 |
| 7562337 |
OPC verification using auto-windowed regions |
Gregory J. Dick, Donald P. Perley, Jacek G. Smolinski |
2009-07-14 |
$8,070,000 |
| 7492941 |
Mask defect analysis system |
Orest Bula, Edward W. Conrad, William C. Leipold, Michael S. Hibbs, Joshua J. Krueger |
2009-02-17 |
$3,763,000 |
| 7492940 |
Mask defect analysis system |
Orest Bula, Edward W. Conrad, William C. Leipold, Michael S. Hibbs, Joshua J. Krueger |
2009-02-17 |
$3,763,000 |
| 7269808 |
Design verification |
James A. Culp, John D. Nickel, Jacek G. Smolinski |
2007-09-11 |
$7,316,000 |
| 7257247 |
Mask defect analysis system |
Orest Bula, Edward W. Conrad, William C. Leipold, Michael S. Hibbs, Joshua J. Krueger |
2007-08-14 |
$10,148,000 |
| 6766507 |
Mask/wafer control structure and algorithm for placement |
Stephen E. Knight, Joshua J. Krueger, Matthew Nicholls, Jed H. Rankin |
2004-07-20 |
$7,882,000 |
| 6577406 |
Structure for lithographic focus control features |
Orest Bula, Emily E. Fisch |
2003-06-10 |
$13,477,000 |
| 6539321 |
Method for edge bias correction of topography-induced linewidth variation |
Orest Bula, Edward W. Conrad, William C. Leipold |
2003-03-25 |
$14,515,000 |
| 6395624 |
Method for forming implants in semiconductor fabrication |
Randy W. Mann |
2002-05-28 |
$13,038,000 |
| 6395438 |
Method of etch bias proximity correction |
Orest Bula, Edward W. Conrad, William C. Leipold |
2002-05-28 |
$13,038,000 |
| 6369397 |
SPM base focal plane positioning |
Brent A. Anderson, Steven J. Holmes, Peter H. Mitchell, Robert A. Myers |
2002-04-09 |
$17,281,000 |
| 6338921 |
Mask with linewidth compensation and method of making same |
David V. Horak, Randy W. Mann, Jed H. Rankin, Andrew J. Watts |
2002-01-15 |
$19,229,000 |
| 6303416 |
Method to reduce plasma etch fluting |
Mary Conroy Bushey, Premlatha Jagannathan, Walter E. Mlyriko, Dianne L. Sundling |
2001-10-16 |
$28,845,000 |
| 6300228 |
Multiple precipitation doping process |
James W. Adkisson, John J. Ellis-Monaghan, Randy W. Mann, Edward J. Nowak, Kirk D. Peterson |
2001-10-09 |
$29,916,000 |
| 6215190 |
Borderless contact to diffusion with respect to gate conductor and methods for fabricating |
Jonathan D. Chapple-Sokol, Charles W. Koburger, III, Michael Lercel, Randy W. Mann, James S. Nakos +3 more |
2001-04-10 |
$37,384,000 |
| 6147394 |
Method of photolithographically defining three regions with one mask step and self aligned isolation structure formed thereby |
Steven J. Holmes, Robert K. Leidy, Walter E. Mlynko, Edward W. Sengle |
2000-11-14 |
$46,730,000 |
| 6015750 |
Method for improving visibility of alignment target in semiconductor processing |
Steven J. Holmes, Robert K. Leidy |
2000-01-18 |
$42,053,000 |
| 5972570 |
Method of photolithographically defining three regions with one mask step and self aligned isolation structure formed thereby |
Steven J. Holmes, Robert K. Leidy, Walter E. Mlynko, Edward W. Sengle |
1999-10-26 |
$20,157,000 |
| 5760483 |
Method for improving visibility of alignment targets in semiconductor processing |
Steven J. Holmes, Robert K. Leidy |
1998-06-02 |
$5,806,000 |
| 5614990 |
Illumination tailoring system using photochromic filter |
Joseph E. Gortych, Michael S. Hibbs |
1997-03-25 |
$8,853,000 |
