| 6221775 |
Combined chemical mechanical polishing and reactive ion etching process |
Thomas G. Ference, William Francis Landers, Michael MacDonald, Mark P. Murray, Kirk D. Peterson |
2001-04-24 |
| 6147394 |
Method of photolithographically defining three regions with one mask step and self aligned isolation structure formed thereby |
James A. Bruce, Steven J. Holmes, Robert K. Leidy, Edward W. Sengle |
2000-11-14 |
| 5972570 |
Method of photolithographically defining three regions with one mask step and self aligned isolation structure formed thereby |
James A. Bruce, Steven J. Holmes, Robert K. Leidy, Edward W. Sengle |
1999-10-26 |
| 5672537 |
Method for preparing a narrow angle defined trench in a substrate |
Daniel Carl, Donald M. Kenney, Son Van Nguyen |
1997-09-30 |
| 5610441 |
Angle defined trench conductor for a semiconductor device |
Daniel Carl, Donald M. Kenney, Son V. Nguyen |
1997-03-11 |
| 5312717 |
Residue free vertical pattern transfer with top surface imaging resists |
Harbans S. Sachdev, John C. Forster, Leo L. Linehan, Scott A. MacDonald, K. Paul Muller +1 more |
1994-05-17 |
| 5110409 |
Enhanced plasma etching |
Frank D. Egitto |
1992-05-05 |
| 5053104 |
Method of plasma etching a substrate with a gaseous organohalide compound |
Suryadevara V. Babu, Joseph G. Hoffarth, Allan R. Knoll, John F. Rembetski, Kenneth D. Mack |
1991-10-01 |
| 4985112 |
Enhanced plasma etching |
Frank D. Egitto |
1991-01-15 |
| 4853081 |
Process for removing contaminant |
— |
1989-08-01 |
| 4654115 |
Process for removing contaminant |
Frank D. Egitto, Francis Emmi, Robin A. Susko |
1987-03-31 |
