Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6221775 | Combined chemical mechanical polishing and reactive ion etching process | Thomas G. Ference, William Francis Landers, Michael MacDonald, Mark P. Murray, Kirk D. Peterson | 2001-04-24 |
| 6147394 | Method of photolithographically defining three regions with one mask step and self aligned isolation structure formed thereby | James A. Bruce, Steven J. Holmes, Robert K. Leidy, Edward W. Sengle | 2000-11-14 |
| 5972570 | Method of photolithographically defining three regions with one mask step and self aligned isolation structure formed thereby | James A. Bruce, Steven J. Holmes, Robert K. Leidy, Edward W. Sengle | 1999-10-26 |
| 5672537 | Method for preparing a narrow angle defined trench in a substrate | Daniel Carl, Donald M. Kenney, Son Van Nguyen | 1997-09-30 |
| 5610441 | Angle defined trench conductor for a semiconductor device | Daniel Carl, Donald M. Kenney, Son V. Nguyen | 1997-03-11 |
| 5312717 | Residue free vertical pattern transfer with top surface imaging resists | Harbans S. Sachdev, John C. Forster, Leo L. Linehan, Scott A. MacDonald, K. Paul Muller +1 more | 1994-05-17 |
| 5110409 | Enhanced plasma etching | Frank D. Egitto | 1992-05-05 |
| 5053104 | Method of plasma etching a substrate with a gaseous organohalide compound | Suryadevara V. Babu, Joseph G. Hoffarth, Allan R. Knoll, John F. Rembetski, Kenneth D. Mack | 1991-10-01 |
| 4985112 | Enhanced plasma etching | Frank D. Egitto | 1991-01-15 |
| 4853081 | Process for removing contaminant | — | 1989-08-01 |
| 4654115 | Process for removing contaminant | Frank D. Egitto, Francis Emmi, Robin A. Susko | 1987-03-31 |