Issued Patents All Time
Showing 1–25 of 30 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11545365 | Chemical planarization | Sudhanshu Misra | 2023-01-03 |
| 9097994 | Abrasive-free planarization for EUV mask substrates | Hariprasad Amanapu, Uma Rames Krishna Laguda, Ranganath Teki | 2015-08-04 |
| 8822340 | Abrasive compositions for chemical mechanical polishing and methods for using same | Pradeepa Dandu, Vamsi Devarapalli, Guillaume Criniere, Claire Pitois | 2014-09-02 |
| 8366959 | Abrasive compositions for chemical mechanical polishing and methods for using same | Pradeepa Dandu, Vamsi Devarapalli, Guillaume Criniere, Claire Pitois | 2013-02-05 |
| 7723234 | Method for selective CMP of polysilicon | Anita Natarajan, Sharath Hegde | 2010-05-25 |
| 7629258 | Method for one-to-one polishing of silicon nitride and silicon oxide | Anita Natarajan | 2009-12-08 |
| 7553430 | Polishing slurries and methods for chemical mechanical polishing | Sunil Chandra, Sreehari Nimmala, Udaya B. Patri, Sharath Hedge, Youngki Hong | 2009-06-30 |
| 7279119 | Silica and silica-based slurry | Stuart D. Hellring, Colin P. McCann, Yuzhuo Li, Satish Narayanan, Robert L. Auger | 2007-10-09 |
| 7101800 | Chemical-mechanical polishing slurry and method | Yie-Shein Her, Ramanathan Srinivasan, Suresh Ramarajan | 2006-09-05 |
| 7091164 | Slurry for chemical mechanical polishing silicon dioxide | Ramanathan Srinivasan, William G. America, Yie-Shein Her | 2006-08-15 |
| 6918820 | Polishing compositions comprising polymeric cores having inorganic surface particles and method of use | Dennis E. Smith | 2005-07-19 |
| 6702954 | Chemical-mechanical polishing slurry and method | Yie-Shein Her, Ramanathan Srinivasan, Suresh Ramarajan | 2004-03-09 |
| 6627107 | Slurry for chemical mechanical polishing silicon dioxide | Ramanathan Srinivasan, William G. America, Yie-Shein Her | 2003-09-30 |
| 6544892 | Slurry for chemical mechanical polishing silicon dioxide | Ramanathan Srinivasan, William G. America, Yie-Shein Her | 2003-04-08 |
| 6491843 | Slurry for chemical mechanical polishing silicon dioxide | Ramanathan Srinivasan, William G. America, Yie-Shein Her | 2002-12-10 |
| 6468910 | Slurry for chemical mechanical polishing silicon dioxide | Ramanathan Srinivasan, William G. America, Yie-Shein Her | 2002-10-22 |
| 6007954 | Electrophotographic apparatus with improved blue sensitivity | Susan A. Visser, Donald S. Rimai, Paul M. Borsenberger | 1999-12-28 |
| 5849443 | Method of making multilayer electrophotographic elements | Susan A. Visser, Donald S. Rimai, Paul M. Borsenberger | 1998-12-15 |
| 5849445 | Multilayer photoconductive elements having low dark decay | Susan A. Visser, Donald S. Rimai, Paul M. Borsenberger | 1998-12-15 |
| 5840427 | Method for making corrosion resistant electrical components | Cancheepuram V. Srividya | 1998-11-24 |
| 5674621 | Fuser members with an outermost layer of a fluorinated diamond like carbon | Susan A. Visser, Cancheepuram V. Srividya | 1997-10-07 |
| 5061359 | Plasma processing apparatus including three bus structures | Neng-Hsing Lu, Carl-Otto Nilsen | 1991-10-29 |
| 5053104 | Method of plasma etching a substrate with a gaseous organohalide compound | Joseph G. Hoffarth, Allan R. Knoll, Walter E. Mlynko, John F. Rembetski, Kenneth D. Mack | 1991-10-01 |
| 5021138 | Side source center sink plasma reactor | Neng-Hsing Lu, Carl-Otto Nilsen | 1991-06-04 |
| 4956197 | Plasma conditioning of a substrate for electroless plating | Neng-Hsing Lu, Gerald W. Jones | 1990-09-11 |