Issued Patents All Time
Showing 25 most recent of 36 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11751512 | Woody rootstock for efficient grafting of solanaceous vegetables and efficient grafting and seedling culture method thereof | Liping Chen, Tingjin Wang, Lu Yuan, Ke Liu, Aijun Zhang +3 more | 2023-09-12 |
| 11168239 | Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors | Robert REICHARDT, Martin Kaller, Michael Lauter, Andreas Klipp | 2021-11-09 |
| 10647900 | Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors | Robert REICHARDT, Martin Kaller, Michael Lauter, Andreas Klipp | 2020-05-12 |
| 10407594 | Chemical mechanical polishing (CMP) composition comprising a polymeric polyamine | Bastian Marten Noller, Diana Franz, Kenneth Rushing, Michael Lauter, Daniel Kwo-Hung Shen +2 more | 2019-09-10 |
| 10392531 | Process for removing a bulk material layer from a substrate and a chemical mechanical polishing agent suitable for this process | Vijay Immanuel Raman, Sophia Ebert, Mario Brands, Yongqing Lan, Philipp Zacharias +1 more | 2019-08-27 |
| 10214663 | Chemical-mechanical polishing composition comprising organic/inorganic composite particles | Yongqing Lan, Bastian Marten Noller, Liang Jiang, Daniel Kwo-Hung Shen, Reza Golzarian | 2019-02-26 |
| 9777192 | Chemical mechanical polishing (CMP) composition comprising a protein | Bastian Marten Noller, Michael Lauter, Roland Lange | 2017-10-03 |
| 9496146 | Method for forming through-base wafer vias | Changxue Wang, Daniel Kwo-Hung Shen | 2016-11-15 |
| 9487674 | Chemical mechanical polishing (CMP) composition comprising a glycoside | Michael Lauter, Roland Lange | 2016-11-08 |
| 9487675 | Chemical mechanical polishing composition comprising polyvinyl phosphonic acid and its derivatives | Vijay Immanuel Raman, Christian Schade, Shyam Sundar Venkataraman, Eason Yu-Shen Su, Sheik Ansar Usman Ibrahim | 2016-11-08 |
| 9458415 | Post chemical-mechanical-polishing (post-CMP) cleaning composition comprising a specific sulfur-containing compound and a sugar alcohol or a polycarboxylic acid | Shyam Sundar Venkataraman, Mingjie Zhong | 2016-10-04 |
| 9443739 | Process for the manufacture of semiconductor devices comprising the chemical mechanical polishing of elemental germanium and/or Si1-xGex material in the presence of a CMP composition comprising a specific organic compound | Bastian Marten Noller, Bettina Drescher, Christophe Gillot | 2016-09-13 |
| 9416298 | Process for the manufacture of semiconductor devices comprising the chemical mechanical polishing (CMP) of III-V material in the presence of a CMP composition comprising a specific non-ionic surfactant | Bastian Marten Noller, Christophe Gillot, Diana Franz | 2016-08-16 |
| 9309448 | Abrasive articles, method for their preparation and method of their use | Christof Kujat, Kenneth Rushing | 2016-04-12 |
| 9263296 | Chemical mechanical polishing (CMP) composition comprising two types of corrosion inhibitors | Bastian Marten Noller, Michael Lauter, Albert Budiman Sugiharto, Kenneth Rushing, Diana Franz +1 more | 2016-02-16 |
| 9255214 | Chemical mechanical polishing (CMP) composition comprising inorganic particles and polymer particles | Michael Lauter, Vijay Immanuel Raman, Shyam Sundar Venkataraman, Daniel Kwo-Hung Shen | 2016-02-09 |
| 9070632 | Aqueous polishing composition and process for chemically mechanically polishing substrates having patterned or unpatterned low-k dielectric layers | Vijay Immanuel Raman, Frank Rittig, Wei-Lan Chiu | 2015-06-30 |
| 9028708 | Process for removing a bulk material layer from a substrate and a chemical mechanical polishing agent suitable for this process | Vijay Immanuel Raman, Mario Brands, Yongqing Lan, Kenneth Rushing, Karpagavalli Ramji | 2015-05-12 |
| 9005472 | Aqueous polishing agent and graft copolymers and their use in a process for polishing patterned and unstructured metal surfaces | Vijay Immanuel Raman, Ilshat Gubaydullin, Mario Brands, Maxim Peretolchin | 2015-04-14 |
| 8980750 | Chemical mechanical polishing (CMP) composition comprising a non-ionic surfactant and a carbonate salt | Robert REICHARDT, Michael Lauter, Wei-Lan Chiu | 2015-03-17 |
| 8927429 | Chemical mechanical polishing (CMP) composition comprising a specific heteropolyacid | Christine Schmitt, Andrey Karpov, Frank Rosowski, Mario Brands | 2015-01-06 |
| 8747687 | Aqueous polishing agent comprising solid polymer particles and two complexing agents and its use in a process for polishing patterned and unstructured metal surfaces | Vijay Immanuel Raman, Ilshat Gubaydullin, Mario Brands, Yongqing Lan | 2014-06-10 |
| 8684793 | Oxidizing particles based slurry for nobel metal including ruthenium chemical mechanical planarization | Karpagavalli Ramji | 2014-04-01 |
| 8679980 | Aqueous metal polishing agent comprising a polymeric abrasiv containing pendant functional groups and its use in a CMP process | Vijay Immanuel Raman, Ilshat Gubaydullin, Mario Brands, Yongqing Lan | 2014-03-25 |
| 8597539 | Chemical mechanical polishing (CMP) polishing solution with enhanced performance | Harvey Wayne Pinder, Shyam Sundar Venkataraman | 2013-12-03 |