Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11317628 | Microparticle compositions comprising saflufenacil | Yannick Fuchs, Anja Simon, Christian Sowa | 2022-05-03 |
| 10407594 | Chemical mechanical polishing (CMP) composition comprising a polymeric polyamine | Yuzhuo Li, Diana Franz, Kenneth Rushing, Michael Lauter, Daniel Kwo-Hung Shen +2 more | 2019-09-10 |
| 10227506 | Chemical mechanical polishing (CMP) composition for high effective polishing of substrates comprising germanium | Max Siebert, Michael Lauter, Yongqing Lan, Robert REICHARDT, Alexandra Muench +4 more | 2019-03-12 |
| 10214663 | Chemical-mechanical polishing composition comprising organic/inorganic composite particles | Yongqing Lan, Yuzhuo Li, Liang Jiang, Daniel Kwo-Hung Shen, Reza Golzarian | 2019-02-26 |
| 9777192 | Chemical mechanical polishing (CMP) composition comprising a protein | Yuzhuo Li, Michael Lauter, Roland Lange | 2017-10-03 |
| 9524874 | Aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon oxide dielectric and polysilicon films | Shyam Sundar Venkataraman, Eason Yu-Shen Su, Arend Jouke Kingma | 2016-12-20 |
| 9443739 | Process for the manufacture of semiconductor devices comprising the chemical mechanical polishing of elemental germanium and/or Si1-xGex material in the presence of a CMP composition comprising a specific organic compound | Bettina Drescher, Christophe Gillot, Yuzhuo Li | 2016-09-13 |
| 9416298 | Process for the manufacture of semiconductor devices comprising the chemical mechanical polishing (CMP) of III-V material in the presence of a CMP composition comprising a specific non-ionic surfactant | Yuzhuo Li, Christophe Gillot, Diana Franz | 2016-08-16 |
| 9263296 | Chemical mechanical polishing (CMP) composition comprising two types of corrosion inhibitors | Michael Lauter, Albert Budiman Sugiharto, Yuzhuo Li, Kenneth Rushing, Diana Franz +1 more | 2016-02-16 |