Issued Patents All Time
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10227506 | Chemical mechanical polishing (CMP) composition for high effective polishing of substrates comprising germanium | Max Siebert, Michael Lauter, Yongqing Lan, Robert REICHARDT, Manuel SIX +4 more | 2019-03-12 |