| 12378439 |
Compositions for tungsten etching inhibition |
Haci Osman GUEVENC, Wei-Lan Chiu, Te Yu Wei |
2025-08-05 |
| 12351737 |
Chemical mechanical polishing of substrates containing copper and ruthenium |
Haci Osman GUEVENC, Te Yu Wei, Wei-Lan Chiu, Reza Golzarian, Julian Proelss +1 more |
2025-07-08 |
| 11993729 |
Chemical mechanical polishing composition |
Christian Daeschlein, Max Siebert, Yongqing Lan, Sheik Ansar Usman Ibrahim, Reza Golzarian +4 more |
2024-05-28 |
| 11725117 |
Chemical mechanical polishing of substrates containing copper and ruthenium |
Haci Osman GUEVENC, Te Yu Wei, Wei-Lan Chiu, Reza Golzarian, Julian Proelss +1 more |
2023-08-15 |
| 11286402 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates |
Robert REICHARDT, Max Siebert, Yongqing Lan, Sheik Ansar Usman Ibrahim, Reza Golzarian +3 more |
2022-03-29 |
| 11264250 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates |
Robert REICHARDT, Max Siebert, Yongqing Lan, Sheik Ansar Usman Ibrahim, Reza Golzarian +3 more |
2022-03-01 |
| 11168239 |
Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors |
Robert REICHARDT, Martin Kaller, Yuzhuo Li, Andreas Klipp |
2021-11-09 |
| 10899945 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates |
Robert REICHARDT, Max Siebert, Yongqing Lan, Sheik Ansar Usman Ibrahim, Reza Golzarian +4 more |
2021-01-26 |
| 10865361 |
Composition for post chemical-mechanical-polishing cleaning |
Christian Daeschlein, Max Siebert, Leonardus Leunissen, Ivan Garcia Romero, Haci Osman GUEVENC +3 more |
2020-12-15 |
| 10844333 |
Composition for post chemical-mechanical-polishing cleaning |
Christian Daeschlein, Max Siebert, Piotr Przybylski, Julian Proelss, Andreas Klipp +4 more |
2020-11-24 |
| 10844325 |
Composition for post chemical-mechanical-polishing cleaning |
Christian Daeschlein, Max Siebert, Peter Przybylski, Julian Proelss, Andreas Klipp +4 more |
2020-11-24 |
| 10738219 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates |
Robert REICHARDT, Max Siebert, Yongqing Lan, Sheik Ansar Usman Ibrahim, Reza Golzarian +3 more |
2020-08-11 |
| 10647900 |
Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors |
Robert REICHARDT, Martin Kaller, Yuzhuo Li, Andreas Klipp |
2020-05-12 |
| 10570316 |
Chemical mechanical polishing (CMP) composition |
Robert REICHARDT, Max Siebert, Yongqing Lan, Haci Osman GUEVENC, Julian Proelss +2 more |
2020-02-25 |
| 10407594 |
Chemical mechanical polishing (CMP) composition comprising a polymeric polyamine |
Bastian Marten Noller, Yuzhuo Li, Diana Franz, Kenneth Rushing, Daniel Kwo-Hung Shen +2 more |
2019-09-10 |
| 10385236 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates |
Robert REICHARDT, Max Siebert, Yongqing Lan, Sheik Ansar Usman Ibrahim, Reza Golzarian +3 more |
2019-08-20 |
| 10227506 |
Chemical mechanical polishing (CMP) composition for high effective polishing of substrates comprising germanium |
Max Siebert, Yongqing Lan, Robert REICHARDT, Alexandra Muench, Manuel SIX +4 more |
2019-03-12 |
| 9777192 |
Chemical mechanical polishing (CMP) composition comprising a protein |
Yuzhuo Li, Bastian Marten Noller, Roland Lange |
2017-10-03 |
| 9487674 |
Chemical mechanical polishing (CMP) composition comprising a glycoside |
Yuzhuo Li, Roland Lange |
2016-11-08 |
| 9263296 |
Chemical mechanical polishing (CMP) composition comprising two types of corrosion inhibitors |
Bastian Marten Noller, Albert Budiman Sugiharto, Yuzhuo Li, Kenneth Rushing, Diana Franz +1 more |
2016-02-16 |
| 9255214 |
Chemical mechanical polishing (CMP) composition comprising inorganic particles and polymer particles |
Vijay Immanuel Raman, Yuzhuo Li, Shyam Sundar Venkataraman, Daniel Kwo-Hung Shen |
2016-02-09 |
| 8980750 |
Chemical mechanical polishing (CMP) composition comprising a non-ionic surfactant and a carbonate salt |
Robert REICHARDT, Yuzhuo Li, Wei-Lan Chiu |
2015-03-17 |
| 6708523 |
Process and apparatus for producing high-purity nitrogen by low-temperature fractionation of air |
Stefan Lochner, Ralph Spöri |
2004-03-23 |
| 6662594 |
Apparatus and process for producing gaseous oxygen under elevated pressure |
Augustin Rampp |
2003-12-16 |
