Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12378439 | Compositions for tungsten etching inhibition | Haci Osman GUEVENC, Wei-Lan Chiu, Te Yu Wei | 2025-08-05 |
| 12351737 | Chemical mechanical polishing of substrates containing copper and ruthenium | Haci Osman GUEVENC, Te Yu Wei, Wei-Lan Chiu, Reza Golzarian, Julian Proelss +1 more | 2025-07-08 |
| 11993729 | Chemical mechanical polishing composition | Christian Daeschlein, Max Siebert, Yongqing Lan, Sheik Ansar Usman Ibrahim, Reza Golzarian +4 more | 2024-05-28 |
| 11725117 | Chemical mechanical polishing of substrates containing copper and ruthenium | Haci Osman GUEVENC, Te Yu Wei, Wei-Lan Chiu, Reza Golzarian, Julian Proelss +1 more | 2023-08-15 |
| 11286402 | Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates | Robert REICHARDT, Max Siebert, Yongqing Lan, Sheik Ansar Usman Ibrahim, Reza Golzarian +3 more | 2022-03-29 |
| 11264250 | Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates | Robert REICHARDT, Max Siebert, Yongqing Lan, Sheik Ansar Usman Ibrahim, Reza Golzarian +3 more | 2022-03-01 |
| 11168239 | Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors | Robert REICHARDT, Martin Kaller, Yuzhuo Li, Andreas Klipp | 2021-11-09 |
| 10899945 | Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates | Robert REICHARDT, Max Siebert, Yongqing Lan, Sheik Ansar Usman Ibrahim, Reza Golzarian +4 more | 2021-01-26 |
| 10865361 | Composition for post chemical-mechanical-polishing cleaning | Christian Daeschlein, Max Siebert, Leonardus Leunissen, Ivan Garcia Romero, Haci Osman GUEVENC +3 more | 2020-12-15 |
| 10844333 | Composition for post chemical-mechanical-polishing cleaning | Christian Daeschlein, Max Siebert, Piotr Przybylski, Julian Proelss, Andreas Klipp +4 more | 2020-11-24 |
| 10844325 | Composition for post chemical-mechanical-polishing cleaning | Christian Daeschlein, Max Siebert, Peter Przybylski, Julian Proelss, Andreas Klipp +4 more | 2020-11-24 |
| 10738219 | Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates | Robert REICHARDT, Max Siebert, Yongqing Lan, Sheik Ansar Usman Ibrahim, Reza Golzarian +3 more | 2020-08-11 |
| 10647900 | Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors | Robert REICHARDT, Martin Kaller, Yuzhuo Li, Andreas Klipp | 2020-05-12 |
| 10570316 | Chemical mechanical polishing (CMP) composition | Robert REICHARDT, Max Siebert, Yongqing Lan, Haci Osman GUEVENC, Julian Proelss +2 more | 2020-02-25 |
| 10407594 | Chemical mechanical polishing (CMP) composition comprising a polymeric polyamine | Bastian Marten Noller, Yuzhuo Li, Diana Franz, Kenneth Rushing, Daniel Kwo-Hung Shen +2 more | 2019-09-10 |
| 10385236 | Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates | Robert REICHARDT, Max Siebert, Yongqing Lan, Sheik Ansar Usman Ibrahim, Reza Golzarian +3 more | 2019-08-20 |
| 10227506 | Chemical mechanical polishing (CMP) composition for high effective polishing of substrates comprising germanium | Max Siebert, Yongqing Lan, Robert REICHARDT, Alexandra Muench, Manuel SIX +4 more | 2019-03-12 |
| 9777192 | Chemical mechanical polishing (CMP) composition comprising a protein | Yuzhuo Li, Bastian Marten Noller, Roland Lange | 2017-10-03 |
| 9487674 | Chemical mechanical polishing (CMP) composition comprising a glycoside | Yuzhuo Li, Roland Lange | 2016-11-08 |
| 9263296 | Chemical mechanical polishing (CMP) composition comprising two types of corrosion inhibitors | Bastian Marten Noller, Albert Budiman Sugiharto, Yuzhuo Li, Kenneth Rushing, Diana Franz +1 more | 2016-02-16 |
| 9255214 | Chemical mechanical polishing (CMP) composition comprising inorganic particles and polymer particles | Vijay Immanuel Raman, Yuzhuo Li, Shyam Sundar Venkataraman, Daniel Kwo-Hung Shen | 2016-02-09 |
| 8980750 | Chemical mechanical polishing (CMP) composition comprising a non-ionic surfactant and a carbonate salt | Robert REICHARDT, Yuzhuo Li, Wei-Lan Chiu | 2015-03-17 |
| 6708523 | Process and apparatus for producing high-purity nitrogen by low-temperature fractionation of air | Stefan Lochner, Ralph Spöri | 2004-03-23 |
| 6662594 | Apparatus and process for producing gaseous oxygen under elevated pressure | Augustin Rampp | 2003-12-16 |