SV

Shyam Sundar Venkataraman

Basf Se: 8 patents #2,129 of 13,826Top 20%
Google: 1 patents #14,769 of 22,993Top 65%
📍 San Jose, CA: #6,939 of 32,062 inventorsTop 25%
🗺 California: #66,801 of 386,348 inventorsTop 20%
Overall (All Time): #532,762 of 4,157,543Top 15%
9
Patents All Time

Issued Patents All Time

Showing 1–9 of 9 patents

Patent #TitleCo-InventorsDate
12238170 On demand serverless container based storage transfer Alankrit Kharbanda, Sowmya Dayanand, Xiangqian Yu, Juan Esteller 2025-02-25
11110433 Metal-doped tin oxide for electrocatalysis applications Xu Peng, Rosalba Adriana Ricon-Ovalles, Domnik Bayer, Andreas Haas 2021-09-07
9524874 Aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon oxide dielectric and polysilicon films Eason Yu-Shen Su, Arend Jouke Kingma, Bastian Marten Noller 2016-12-20
9487675 Chemical mechanical polishing composition comprising polyvinyl phosphonic acid and its derivatives Vijay Immanuel Raman, Yuzhuo Li, Christian Schade, Eason Yu-Shen Su, Sheik Ansar Usman Ibrahim 2016-11-08
9458415 Post chemical-mechanical-polishing (post-CMP) cleaning composition comprising a specific sulfur-containing compound and a sugar alcohol or a polycarboxylic acid Yuzhuo Li, Mingjie Zhong 2016-10-04
9275851 Aqueous, nitrogen-free cleaning composition and its use for removing residues and contaminants from semiconductor substrates suitable for manufacturing microelectronic devices Andreas Klipp, Vijay Immanuel Raman, Raimund Mellies, Mingjie Zhong 2016-03-01
9255214 Chemical mechanical polishing (CMP) composition comprising inorganic particles and polymer particles Michael Lauter, Vijay Immanuel Raman, Yuzhuo Li, Daniel Kwo-Hung Shen 2016-02-09
9157012 Process for the manufacture of semiconductor devices comprising the chemical mechanical polishing of borophosphosilicate glass (BPSG) material in the presence of a CMP composition comprising anionic phosphate or phosphonate Eason Yu-Shen Su 2015-10-13
8597539 Chemical mechanical polishing (CMP) polishing solution with enhanced performance Yuzhuo Li, Harvey Wayne Pinder 2013-12-03